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Tetraaethylammonium-perfluorbutyl-sulfonat | 25628-08-4

中文名称
——
中文别名
——
英文名称
Tetraaethylammonium-perfluorbutyl-sulfonat
英文别名
tetraethylammoniumperfluorobutylsulfonate;Tetraethylammonium (perfluorobutyl)sulfonate;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;tetraethylazanium
Tetraaethylammonium-perfluorbutyl-sulfonat化学式
CAS
25628-08-4
化学式
C4F9O3S*C8H20N
mdl
——
分子量
429.347
InChiKey
QTRJKFBGNXKFFF-UHFFFAOYSA-M
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 密度:
    1.343-1.35 at 20℃
  • 表面张力:
    62.1-62.2mN/m at 1g/L and 20℃

计算性质

  • 辛醇/水分配系数(LogP):
    3.84
  • 重原子数:
    26
  • 可旋转键数:
    6
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    65.6
  • 氢给体数:
    0
  • 氢受体数:
    12

反应信息

  • 作为产物:
    描述:
    二乙氧基二甲基硅烷全氟丁基磺酰氟三乙胺乙醚 为溶剂, 以78.5%的产率得到Tetraaethylammonium-perfluorbutyl-sulfonat
    参考文献:
    名称:
    Gmelin Handbuch der Anorganischen Chemie, Gmelin Handbook: F: PerFHalOrg.SVol.3, 6.2.3.4, page 152 - 186
    摘要:
    DOI:
点击查看最新优质反应信息

文献信息

  • COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMING METHOD, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND
    申请人:JSR CORPORATION
    公开号:US20190094695A1
    公开(公告)日:2019-03-28
    The composition for film formation includes a compound including a group of the formula (1) and a solvent. In the formula (1), R 1 to R 4 each independently represent a hydrogen atom, a monovalent organic group having 1 to 20 carbon atoms, or R 1 to R 4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which R 1 to R 4 bond. Ar 1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms. n is an integer of 0 to 9. R 5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms.
    影片形成的组合物包括一个化合物,其中包括一个公式(1)的基团和一个溶剂。在公式(1)中,R1至R4分别代表氢原子,具有1至20个碳原子的一价有机基团,或者R1至R4一起代表具有3至20个环原子的环结构,该环结构与碳原子或R1至R4键合的碳链一起。Ar1代表通过从具有6至20个碳原子的芳香环中去除(n+3)个氢原子而获得的基团。n为0至9之间的整数。R5代表一个羟基,一个卤素原子,一个硝基,或者具有1至20个碳原子的一价有机基团。
  • Antireflection film composition, patterning process and substrate using the same
    申请人:Shinetsu Chemical Co., Ltd.
    公开号:EP1798599A1
    公开(公告)日:2007-06-20
    There is disclosed an antireflection film composition for forming an intermediate resist film of a multilayer resist film used in lithography comprising: at least a polymer obtained by reacting a chelating agent with a polymer having a repeating unit represented by the following general formula (1); an organic solvent; and an acid generator. There can be provided a novel antireflection film composition that exhibits high etch selection ratio to a photoresist film, that forms a dense inorganic film, whereby an excellent pattern can be formed on the overlying photoresist film, that can be removed with wet stripping, that exhibits high preservation stability and high dry etching resistance when an underlying layer is etched, and that is suitable for forming an intermediate resist film of a multilayer resist film; a patterning process in which an antireflection film is formed over a substrate by using the antireflection film composition; and a substrate having the antireflection film as an intermediate resist film.
    本发明公开了一种用于形成光刻技术中使用的多层光刻胶膜的中间光刻胶膜的抗反射膜组合物,该组合物包括:至少一种通过螯合剂与具有以下通式(1)所代表的重复单元的聚合物反应而得到的聚合物;一种有机溶剂;以及一种酸发生器。本发明提供了一种新型抗反射膜组合物,该组合物对光刻胶膜具有高蚀刻选择比,可形成致密的无机膜,从而可在上覆的光刻胶膜上形成极佳的图案,该组合物可通过湿法剥离去除,当底层被蚀刻时,该组合物具有高保存稳定性和高抗干蚀刻性,并且适用于形成多层抗蚀膜的中间抗蚀膜;使用该抗反射膜组合物在基底上形成抗反射膜的图案化工艺;以及具有该抗反射膜作为中间抗蚀膜的基底。
  • POLYCARBONATE RESIN, POLYCARBONATE RESIN COMPOSITION, OPTICAL FILM, AND POLYCARBONATE RESIN MOLDED ARTICLE
    申请人:Mitsubishi Chemical Corporation
    公开号:EP2371877A1
    公开(公告)日:2011-10-05
    An object of the invention is to provide polycarbonate resins containing a specific end group and having excellent heat resistance and transparency, and compositions which contain the polycarbonate resins. The invention relates to a polycarbonate resin obtained by the polycondensation of a dihydroxy compound having a linking structure of the following structural formula (1) with a carbonic diester, characterized by containing one or more end groups each represented by the following structural formula (2). (No hydrogen atom is bonded to the oxygen atom contained in structural formula (1).)
    本发明的目的是提供含有特定端基并具有优异耐热性和透明度的聚碳酸酯树脂,以及含有该聚碳酸酯树脂的组合物。本发明涉及一种聚碳酸酯树脂,它是由具有以下结构式(1)连接结构的二羟基化合物 与碳酸二酯缩聚而成,其特征是含有一个或多个由以下结构式(2)表示的端基。 (结构式(1)中所含的氧原子上没有键合氢原子)。
  • Polycarbonate resins, polycarbonate resin compositions, optical film, and polycarbonate resin molded articles
    申请人:MITSUBISHI CHEMICAL CORPORATION
    公开号:EP2789640A1
    公开(公告)日:2014-10-15
    The present invention relates to a polycarbonate resin which contains at least constituent units derived from a dihydroxy compound having a linking structure of the following structural formula (1), characterized in that the content therein of an aromatic monohydroxy compound which may have an alkyl group having 5 or less carbon atoms is 700 ppm or less and the content therein of the dihydroxy compound having a linking structure of structural formula (1) is 60 ppm or less, wherein no hydrogen atom is bonded to the oxygen atom contained in structural formula (1).
    本发明涉及一种聚碳酸酯树脂,该树脂至少含有由具有以下结构式(1)连接结构的二羟基化合物衍生的组成单元,其特征在于其中芳香族单羟基化合物的含量为 700 ppm 或更少,该芳香族单羟基化合物可能具有 5 个或更少碳原子的烷基,而具有结构式(1)连接结构的二羟基化合物的含量为 60 ppm 或更少、 其中没有氢原子与结构式(1)中所含的氧原子键合。
  • Compositions and articles of manufacture containing siloxane
    申请人:An Narong
    公开号:US10174182B2
    公开(公告)日:2019-01-08
    Compositions containing a polycarbonate and a linear and cyclic phenyl containing siloxanes are disclosed. Specifically, a composition comprising: (a) a branched polycarbonate resin, (b) a flame retardant, (c) at least one linear phenyl containing siloxane and at least one cyclic phenyl containing siloxane, and (d) a linear polycarbonate resin when said branched polycarbonate is less than 100% based upon weight percent of total polycarbonate in said composition, wherein the amounts of said branched and linear polycarbonate resins, said linear siloxanes and cyclic siloxanes, and flame retardant are in amounts effective to provide a molded article from said composition with a UL94 V0 p(FTP) value of 0.90 or greater at a thickness of between 1 mm and 2.5 mm or at 2.5 mm or at 1.5 mm or at 1 mm is disclosed. In addition, a composition comprising: (a) a linear polycarbonate resin, (b) a flame retardant, (c) at least one phenyl-containing linear siloxane and at least one phenyl-containing cyclic siloxane, wherein the amounts of said linear polycarbonate resins, said phenyl-containing linear siloxanes and said phenyl-containing cyclic siloxanes, and said flame retardant are in amounts effective to provide a molded article of said composition with a UL94 V0 p(FTP) value of 0.90 or greater at a thickness of between 1 mm and 2.5 mm or at 2.5 mm or at 1.5 mm or at 1 mm is disclosed.
    本发明公开了一种含有聚碳酸酯和含硅氧烷的线性和环状苯基的组合物。具体来说,该组合物包含(a) 支链聚碳酸酯树脂,(b) 阻燃剂,(c) 至少一种线性含苯基硅氧烷和至少一种环状含苯基硅氧烷,以及 (d) 当所述支链聚碳酸酯占所述组合物中聚碳酸酯总重量的百分比小于 100%时的线性聚碳酸酯树脂、其中,所述支链聚碳酸酯树脂和线性聚碳酸酯树脂、所述线性硅氧烷和环状硅氧烷以及阻燃剂的用量应能有效地使所述组合物制成的模塑制品在厚度介于 0.90 或更高。此外,还公开了一种组合物,该组合物包含:(a) 线性聚碳酸酯树脂,(b) 阻燃剂,(c) 至少一种含苯基的线性硅氧烷和至少一种含苯基的环状硅氧烷,其中所述线性聚碳酸酯树脂、所述含苯基的线性硅氧烷和所述含苯基的环状硅氧烷以及所述阻燃剂的用量能有效地使所述组合物的成型制品在厚度介于 1 毫米和 2.5 毫米之间时的 UL94 V0 p(FTP) 值为 0.90 或更高,厚度在 1 毫米至 2.5 毫米之间或 2.5 毫米或 1.5 毫米或 1 毫米。
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