1-naphthylmethyl 2-methylpropanoate | 72524-21-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 1-naphthylmethyl 2-methylpropanoate
• 英文别名: 1-naphthylmethyl isobutyrate；naphthalen-1-ylmethyl isobutyrate；1-Isobutyryloxymethyl-naphthalin；Naphthalen-1-ylmethyl 2-methylpropanoate
• CAS: 72524-21-1
• 化学式: C₁₅H₁₆O₂
• 分子量: 228.291
• InChiKey: DADFWSQITRKYPG-UHFFFAOYSA-N

物化性质

• 沸点：
  338.0±11.0 °C(Predicted)
• 密度：
  1.088±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  17
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.27
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  1-naphthylmethyl 2-methylpropanoate 在 盐酸 、 三甲基氯硅烷 、 lithium diisopropyl amide 作用下， 生成 2,2-dimethyl-3-(1'-naphthyl)propanoic acid
  参考文献：
  名称：

  Competitive [1,3]- and [3,3]-sigmatropic rearrangements

  摘要：

  DOI：

  10.1021/jo01293a024
• 作为产物：
  描述：

  1-萘甲醇 、 异丁酰氯 在 吡啶 作用下， 以 苯 为溶剂， 以50%的产率得到1-naphthylmethyl 2-methylpropanoate
  参考文献：
  名称：

  Rates of decarboxylation of acyloxy radicals formed in the photocleavage of substituted 1-naphthylmethyl alkanoates

  摘要：

  Rates of decarboxylation (k(CO2)R) have been estimated for the acyloxy radicals 7a-f formed in the photolysis of substituted 1-naphthylmethyl alkanoates 6a-f. These rates are based on a proposed mechanism involving initial carbon-oxygen homolytic bond cleavage from the excited singlet state. The products are formed by two competing pathways: electron transfer in the radical pair to give an ion pair and decarboxylation. Measured product yields along with an estimate of the electron-transfer rate (k(ET)) allow calculation of k(CO2)R as a function of R. The values obtained are the following (R, k (10(9) s-1)): CH3, < 1.3; CH3CH2, 2.0; (CH3)2CH, 6.5; (CH3)3C, 11; PhCH2, 5.0; PhCH2CH2, 2.3.

  DOI：

  10.1021/ja00007a049

文献信息

• PIPERIZINYL MACROCYCLIC HEPATITIS C SERINE PROTEASE INHIBITORS
  申请人：Sun Ying

  公开号：US20080286233A1

  公开（公告）日：2008-11-20

  The present invention relates to compounds of Formula I, or a pharmaceutically acceptable salt, ester, or prodrug, thereof: which inhibit serine protease activity, particularly the activity of hepatitis C virus (HCV) NS3-NS4A protease. Consequently, the compounds of the present invention interfere with the life cycle of the hepatitis C virus and are also useful as antiviral agents. The present invention further relates to pharmaceutical compositions comprising the aforementioned compounds for administration to a subject suffering from HCV infection. The invention also relates to methods of treating an HCV infection in a subject by administering a pharmaceutical composition comprising the compounds of the present invention.

  本发明涉及式I的化合物，或其药学上可接受的盐、酯或前药：这些化合物抑制丝氨酸蛋白酶活性，特别是乙型肝炎病毒（HCV）NS3-NS4A蛋白酶的活性。因此，本发明的化合物干扰了乙型肝炎病毒的生命周期，也可用作抗病毒剂。本发明还涉及包含上述化合物的药物组合物，用于治疗患有HCV感染的受试者。本发明还涉及通过给予含有本发明化合物的药物组合物来治疗受试者的HCV感染的方法。
• COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160024005A1

  公开（公告）日：2016-01-28

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by the following formula (1) or (2), and the formula (1) and (2) are defined as herein, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising a step of exposing the resist film, and a step of developing the exposed film, and a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种包含下列式子（1）或（2）所代表的化合物的光致射线敏感或辐射敏感的树脂组合物，其中式（1）和（2）的定义如本文所述，以及包括该光致射线敏感或辐射敏感的树脂组合物的光阻膜，以及包括曝光光阻膜的步骤和显影曝光膜的步骤的图案形成方法，以及包括图案形成方法的制造电子装置的方法，以及由电子装置的制造方法制造的电子装置。
• PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD AND RESIST FILM USING THE PHOTOSENSITIVE COMPOSITION
  申请人：Wada Kenji

  公开号：US20100239978A1

  公开（公告）日：2010-09-23

  A photosensitive composition containing a compound having a specific structure, a pattern-forming method using the photosensitive composition, and a compound having a specific structure used in the photosensitive composition.

  一种含有特定结构化合物的光敏组合物，使用该光敏组合物进行的图案形成方法，以及用于该光敏组合物的具有特定结构的化合物。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND RESIN
  申请人：FUJIFILM Corporation

  公开号：US20150132688A1

  公开（公告）日：2015-05-14

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种光致射线敏感或辐射敏感的树脂组合物，其中包括（P）具有（a）由特定公式表示的重复单元的树脂；使用该光致射线敏感或辐射敏感的树脂组合物形成的抗蚀膜；包括（i）使用该光致射线敏感或辐射敏感的树脂组合物形成膜的步骤，（ii）曝光膜的步骤，以及（iii）使用显影剂显影曝光的膜以形成图案的图案形成方法；一种制造电子设备的方法，包括图案形成方法；以及通过电子设备的制造方法制造的电子设备。
• PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160018734A1

  公开（公告）日：2016-01-21

  There is provided a pattern forming method comprising (a) a step of forming a film on a substrate using an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, (b) a step of forming a top coat layer on the film using a top coat composition containing a resin (T) containing at least any one of repeating units represented by formulae (I-1) to (I-5) shown below, (c) a step of exposing the film having the top coat layer using an electron beam or an extreme ultraviolet radiation, and (d) a step of developing the film having the top coat layer after the exposure to form a pattern.

  提供了一种图案形成方法，包括以下步骤：(a)使用电子束敏感或极紫外辐射敏感的树脂组合物在基板上形成薄膜的步骤，(b)使用含有至少一个由下式(I-1)到(I-5)中所示的重复单元表示的树脂(T)的顶层涂料组成的顶层涂料层的形成步骤，(c)使用电子束或极紫外辐射照射具有顶层涂料层的薄膜的步骤，以及(d)在照射后开发具有顶层涂料层的薄膜以形成图案的步骤。