N~2~,N~2~,N~4~,N~4~,N~6~,N~6~-Hexakis(butoxymethyl)-1,3,5-triazine-2,4,6-triamine | 7517-78-4

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: N~2~,N~2~,N~4~,N~4~,N~6~,N~6~-Hexakis(butoxymethyl)-1,3,5-triazine-2,4,6-triamine
• 英文别名: 2-N,2-N,4-N,4-N,6-N,6-N-hexakis(butoxymethyl)-1,3,5-triazine-2,4,6-triamine
• CAS: 7517-78-4
• 化学式: C₃₃H₆₆N₆O₆
• 分子量: 642.9
• InChiKey: HULXHFBCDAMNOZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.5
• 重原子数：
  45
• 可旋转键数：
  33
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.91
• 拓扑面积：
  104
• 氢给体数：
  0
• 氢受体数：
  12

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200262787A1

  公开（公告）日：2020-08-20

  The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

  本发明提供了一种包括含碲化合物或含碲树脂的光学元件成型组合物。
• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
  申请人：Enomoto Yuichiro

  公开号：US20120282548A1

  公开（公告）日：2012-11-08

  Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

  提供的是一种形成图案的方法，包括(i)使用光致或辐射敏感树脂组成物形成薄膜的步骤，(ii)曝光薄膜的步骤，以及(iii)使用有机溶剂含有的显影剂显影曝光后的薄膜的步骤，其中光致或辐射敏感树脂组成物包括(A)一种能够通过酸的作用降低有机溶剂含有的显影剂的溶解度的树脂，(B)一种能够在光致或辐射照射下生成酸的化合物，(D)一种溶剂，以及(G)一种具有氟原子和硅原子中的至少一种，并具有碱性或能够通过酸的作用增加碱性的化合物。
• CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD
  申请人：Takasuka Masaaki

  公开号：US20120282546A1

  公开（公告）日：2012-11-08

  Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition. Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition.

  本发明涉及一种具有高溶解度、高灵敏度、能够形成良好形状的抗蚀图案，且很少引起抗蚀图案崩塌的环状化合物；一种制备该环状化合物的方法；一种含有该环状化合物的辐射敏感组合物；以及使用该组合物的抗蚀图案形成方法。具体揭示了一种具有特定结构的环状化合物，制备该环状化合物的方法，含有该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。
• Polyfunctional phenolic reaction product, a process for its preparation and its use
  申请人：THE DOW CHEMICAL COMPANY

  公开号：EP0154789A1

  公开（公告）日：1985-09-18

  A polyfunctional reaction product having functional phenolic OH groups is made available by reacting a phenol and an alkoxylated amine-aldehyde condensation product in the presence of a solvent and of an acid catalyst. This method makes it possible to prepare a polyfunctional phenolic reaction product which is soluble in organic solvents at a low ratio of phenolic OH groups to alkoxy groups without gelling. The reaction product is particularly useful as a curing agent for epoxy resins.

  在有溶剂和酸催化剂存在的情况下，通过苯酚和烷氧基化胺-醛缩合产物的反应，可以制备出具有官能团酚羟基的多官能团反应产物。这种方法可以制备出一种多官能团酚醛反应产物，该产物可溶于有机溶剂，酚羟基和烷氧基的比例较低，且不会胶凝。该反应产物尤其可用作环氧树脂的固化剂。