PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS
申请人:Ito Toshiki
公开号:US20080187865A1
公开(公告)日:2008-08-07
A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1):
wherein R
1
to R
10
are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.