1-Octadecanamine, N-methyl-N-propyl-, N-oxide | 107016-84-2

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: 1-Octadecanamine, N-methyl-N-propyl-, N-oxide
• 英文别名: N-methyl-N-propyloctadecan-1-amine oxide
• CAS: 107016-84-2
• 化学式: C22H47NO
• 分子量: 341.6
• InChiKey: PWTGKHQQFWIXAZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  9.4
• 重原子数：
  24
• 可旋转键数：
  19
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  18.1
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  N-methyl-N-propyloctadecan-1-amine 、 氯乙酸 、 双氧水 以13%的产率得到
  参考文献：
  名称：

  KOZLOV N. S.; KACHEROVSKAYA F. B.; SERZHANINA V. A.; VASILENOK YU. I.; YU+, VESTSI AN BSSR. CEP. XIM. N.,(1986) N 5, 57-61

  摘要：

  DOI：

文献信息

• Coating agent for reducing roughness of resist pattern, and method for forming resist pattern in which roughness is reduced
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10254651B2

  公开（公告）日：2019-04-09

  A coating agent capable of favorably reducing the roughness of a resist pattern and a method for forming a resist pattern in which roughness is reduced. The method includes coating the resist pattern with the coating agent. The coating agent is a composition including a resin, a quaternary carbon-atom-containing compound, and a solvent, the quaternary carbon-atom-containing compound having an aliphatic hydrocarbon group having 1 to 8 carbon atoms and a group having a specific structure having a specific amount of ethylene oxide and/or propylene oxide added thereto.

  一种能有效降低抗蚀剂图案粗糙度的涂层剂，以及形成粗糙度降低的抗蚀剂图案的方法。该方法包括用涂层剂涂布抗蚀图案。涂层剂是一种组合物，包括树脂、含碳原子的季化合物和溶剂，含碳原子的季化合物具有 1 至 8 个碳原子的脂肪族烃基和具有特定结构的基团，其中添加了特定量的环氧乙烷和/或环氧丙烷。
• Detergent For Lithography And Method Of Forming Resist Pattern With The Same
  申请人：Sawada Yoshihiro

  公开号：US20090004608A1

  公开（公告）日：2009-01-01

  Conventional detergents for lithography which contain a surfactant as an active ingredient should have a reduced surfactant concentration because heightened surfactant concentrations result in dissolution of the resin component of a photoresist composition and hence in a dimensional change of a resist pattern. However, the conventional detergents have had a drawback that such a low concentration unavoidably reduces the ability to inhibit pattern falling and defect occurrence. A detergent for lithography is provided which is an aqueous solution containing (A) at least one member selected among nitrogenous cationic surfactants and nitrogenous ampholytic surfactants and (B) an anionic surfactant. This detergent retains a low surface tension even when it has a low concentration. It is effective in inhibiting pattern falling and defect occurrence. It can also inhibit resist patterns from fluctuating in dimension.
• COATING FORMATION AGENT FOR PATTERN MICRO-FABRICATION, AND MICROPATTERN FORMATION METHOD USING THE SAME
  申请人：Ishikawa Kiyoshi

  公开号：US20100090372A1

  公开（公告）日：2010-04-15

  Provided are a coating formation agent for pattern micro-fabrication, and a method for forming a micropattern using the same, which enables: suppression and/or control of variation of the micro-fabrication size without being accompanied by defect generation following the micro-fabrication process even in ultramicro-fabrication particularly on the order of no greater than 120 nm, or a micro-fabrication process of a resist pattern with an increased aspect ratio; maintainance of a favorable resist pattern configuration after the micro-fabrication process while keeping the desired micro-fabrication size; and also avoidance of defects resulting from development of bacteria and the like after application of the coating formation agent for pattern micro-fabrication. The coating formation agent for pattern micro-fabrication of the present invention is a coating formation agent used for forming a micropattern by coating on a substrate having a photoresist pattern, the coating formation agent including: as component (a), a water soluble polymer; and, as component (b), at least one selected from quaternary ammonium hydroxide, alicyclic ammonium hydroxide and morpholinium hydroxide.
• COATING AGENT FOR REDUCING ROUGHNESS OF RESIST PATTERN, AND METHOD FOR FORMING RESIST PATTERN IN WHICH ROUGHNESS IS REDUCED
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20180101098A1

  公开（公告）日：2018-04-12

  A coating agent capable of favorably reducing the roughness of a resist pattern and a method for forming a resist pattern in which roughness is reduced. The method includes coating the resist pattern with the coating agent. The coating agent is a composition including a resin, a quaternary carbon-atom-containing compound, and a solvent, the quaternary carbon-atom-containing compound having an aliphatic hydrocarbon group having 1 to 8 carbon atoms and a group having a specific structure having a specific amount of ethylene oxide and/or propylene oxide added thereto.
• US7795197B2
  申请人：——

  公开号：US7795197B2

  公开（公告）日：2010-09-14