cycloheptanone O-(1-adamantyl)carbonyloxime | 1240949-50-1

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: cycloheptanone O-(1-adamantyl)carbonyloxime
• 英文别名: (cycloheptylideneamino) adamantane-1-carboxylate
• CAS: 1240949-50-1
• 化学式: C₁₈H₂₇NO₂
• 分子量: 289.418
• InChiKey: PUHVIBRQUWPWPR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  21
• 可旋转键数：
  3
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  38.7
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  环庚酮肟 、 金刚烷酰氯 在 吡啶 作用下， 以 正己烷 为溶剂， 以91%的产率得到cycloheptanone O-(1-adamantyl)carbonyloxime
  参考文献：
  名称：

  环戊酮和环庚酮肟的O-酰基衍生物

  摘要：

  通过用羧酸酐或氯化物酰化环戊酮和环庚酮肟，得到了环戊酮和环庚酮肟的新酯，并研究了它们的光谱特性。

  DOI：

  10.1134/s1070428010020065

文献信息

• RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20130115555A1

  公开（公告）日：2013-05-09

  There are provided a method of forming a resist pattern includes: a step ( 1 ) in which a resist composition containing a base component (A) that generates base upon exposure and exhibits increased solubility in an alkali developing solution by the action of acid is applied to a substrate to form a resist film; a step ( 2 ) in which the resist film 2 is subjected to exposure; a step ( 3 ) in which baking is conducted after the step ( 2 ); and a step ( 4 ) in which the resist film 2 is subjected to an alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion 2 b of the resist film 2 has been dissolved and removed, and the resist composition used in the step ( 1 ).
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND NOVEL COMPOUND
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20130177854A1

  公开（公告）日：2013-07-11

  A resist composition including a base component (A) which exhibits changed solubility in a developing solution, and an acidic compound component (J) which is decomposed by exposure to exhibit decreased acidity, wherein the acidic compound component (J) contains a compound represented by formula (J1) [in the formula, R 1 represents H, OH, halogen atom, alkoxy group, hydrocarbon group or nitro group; m represents 0-4; n represents 0-3; Rx represents H or hydrocarbon group; X 1 represents divalent linking group; X 2 represents H or hydrocarbon group; Y represents single bond or C(O); A represents alkylene group which may be substituted with oxygen atom, carbonyl group or alkylene group which may have fluorine atom; Q 1 and Q 2 represents F or fluorinated alkyl group; and W + represents primary, secondary or tertiary ammonium coutercation which exhibits pKa smaller than pKa of H 2 N + (X 2 )—X 1 —Y—O-A-C(Q 1 )(Q 2 )—SO 3 − generated by decomposition upon exposure].
• US8900795B2
  申请人：——

  公开号：US8900795B2

  公开（公告）日：2014-12-02
• US9029070B2
  申请人：——

  公开号：US9029070B2

  公开（公告）日：2015-05-12
• O-acyl derivatives of cyclopentanone and cycloheptanone oximes
  作者：N. A. Zhukovskaya、E. A. Dikusar

  DOI：10.1134/s1070428010020065

  日期：2010.2

  By acylation of cyclopentanone and cycloheptanone oximes with carboxylic acids anhydrides or chlorides new esters were obtained of cyclopentanone and cycloheptanone oximes and their spectral characteristics were investigated.

  通过用羧酸酐或氯化物酰化环戊酮和环庚酮肟，得到了环戊酮和环庚酮肟的新酯，并研究了它们的光谱特性。