The disclosure concerns sterically hindered amine light stabilizers (HALS) with low basicity at the nitrogen atom and high thermal stability. They are characterized by their spiro-substitution in the 4-position of the tetramethylpiperidine ring (Spiro-NOR-HALS). These compounds are useful in stabilizing polymers, especially thermoplastic polyolefins, against the deleterious effects of oxidative, thermal and actinic radiation. The compounds are also useful in stabilizing acid catalyzed and ambient cured coatings systems. They are particularly useful when high processing temperatures are additional required.
本公开涉及具有氮原子低碱性和高热稳定性的立体位阻
胺类光稳定剂(HALS)。它们的特点是在四甲基
哌啶环的4位进行螺环取代(Spiro-NOR-HALS)。这些化合物在稳定聚合物,特别是热塑性聚烯烃,抵御氧化,热和光辐射的有害影响方面非常有用。这些化合物还可用于稳定酸催化和环境固化的涂层系统。当需要高加工温度时,它们尤其有用。