PHOTOACID-GENERATING COMPOUND AND ASSOCIATED POLYMER, PHOTORESIST COMPOSITION, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE
申请人:Rohm and Haas Electronic Materials LLC
公开号:US20180095363A1
公开(公告)日:2018-04-05
A photoacid-generating compound has the structure
wherein m, n, R
1
, R
2
, X, Y, and Z
−
are defined herein. The photoacid-generating compound exhibits strong absorption and chemical sensitivity to extreme ultraviolet radiation, while also absorbing longer wavelengths with desirably reduced chemical sensitivity. Also described are a polymer incorporating the residue of a polymerizable version of the photoacid-generating compound, a photoresist composition that includes the photoacid-generating compound, the polymer, or a combination thereof, and a method of forming a photoresist relief image using the photoresist composition.
一种光酸生成化合物具有结构,其中m、n、R1、R2、X、Y和Z−在此处定义。该光酸生成化合物对极紫外辐射具有强吸收和化学敏感性,同时还吸收较长波长并具有较低的化学敏感性。还描述了一种聚合物,其中包含可聚合版本的光酸生成化合物的残留物,一种包含该光酸生成化合物、聚合物或两者组合的光阻剂组合物,以及使用该光阻剂组合物形成光阻剂