6-propargyloxy-2-naphthalenecarboxylic acid | 193631-22-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 6-propargyloxy-2-naphthalenecarboxylic acid
• 英文别名: 6-propargyloxy-2-naphthoic acid；6-[(Prop-2-yn-1-yl)oxy]naphthalene-2-carboxylic acid；6-prop-2-ynoxynaphthalene-2-carboxylic acid
• CAS: 193631-22-0
• 化学式: C₁₄H₁₀O₃
• 分子量: 226.232
• InChiKey: XHJAAMIMWCTITH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  17
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  6-propargyloxy-2-naphthalenecarboxylic acid 、 1,3,5-三缩水甘油-S-三嗪三酮 在 苄基三乙基氯化铵 作用下， 反应 12.0h， 生成 C₅₄H₄₅N₃O₁₅
  参考文献：
  名称：

  有機膜形成用化合物、有機膜形成用組成物、有機膜形成方法、及びパターン形成方法

  摘要：

  提供具有高度嵌入/平坦特性的有机膜形成组合物的有机膜形成化合物。解决方案是一种有机膜形成化合物，其最小复合粘度在50℃至300℃的范围内测量为10Pa·s以下。选择图：无。

  公开号：

  JP2017119670A

文献信息

• MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20210181637A1

  公开（公告）日：2021-06-17

  The present invention provides a material for forming an organic film, containing a compound shown by the following general formula (1), and an organic solvent, where X represents an organic group having a valency of n1 and 2 to 50 carbon atoms, n1 represents an integer of 1 to 10, and R 1 represents at least one or more of the following general formulae (2) to (4). This aims to provide an organic film material for forming an organic film that has all of high filling property, high planarizing property, and excellent adhesive force to a substrate.

  本发明提供了一种用于形成有机薄膜的材料，包含以下通用式（1）所示的化合物和有机溶剂，其中X代表具有n1价的有机基团，具有2至50个碳原子，n1代表1至10的整数，R1代表至少一个或更多以下通用式（2）至（4）中的一种。这旨在提供一种用于形成具有高填充性、高平整性和对基底具有优异粘附力的有机薄膜的有机薄膜材料。
• ORGANIC FILM COMPOSITION, PROCESS FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160336189A1

  公开（公告）日：2016-11-17

  An organic film composition including a compound represented by the following general formula (1), wherein n1 and n2 each independently represent 0 or 1; “W” represents a single bond or any of structures represented by the following formula (2); R 1 represents any of structures represented by the following general formula (3); m1 and m2 each independently represent an integer of 0 to 7, with the proviso that m1+m2 is 1 to 14. There can be provided an organic film composition for forming an organic film having dry etching resistance as well as advanced filling/planarizing characteristics.

  一种有机薄膜组合物，包括以下通式（1）所表示的化合物，其中n1和n2各自独立地表示0或1；“W”表示单键或以下式（2）所表示的任何结构之一；R1表示以下通式（3）所表示的任何结构之一；m1和m2各自独立地表示0到7的整数，但m1+m2为1到14。可以提供一种有机薄膜组合物，用于形成具有干法蚀刻抗性以及先进的填充/平坦化特性的有机薄膜。
• Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10429739B2

  公开（公告）日：2019-10-01

  The present invention provides a compound for forming an organic film which has a minimum complex viscosity of 10 Pa·s or less when the complex viscosity is measured within a range of 50° C. to 300° C. This compound for forming an organic film can provide an organic film composition having high filling and planarizing properties.

  本发明提供了一种用于形成有机薄膜的化合物，当在 50° C 至 300° C 范围内测量复合粘度时，该化合物的最小复合粘度为 10 Pa-s 或更低。
• COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170183531A1

  公开（公告）日：2017-06-29

  The present invention provides a compound for forming an organic film which has a minimum complex viscosity of 10 Pa·s or less when the complex viscosity is measured within a range of 50° C. to 300° C. This compound for forming an organic film can provide an organic film composition having high filling and planarizing properties.
• US9728420B2
  申请人：——

  公开号：US9728420B2

  公开（公告）日：2017-08-08