N-(2,2,2-Trifluoroethyl)butan-1-amine | 80395-40-0

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: N-(2,2,2-Trifluoroethyl)butan-1-amine
• CAS: 80395-40-0
• 化学式: C₆H₁₂F₃N
• mdl: MFCD09946800
• 分子量: 155.16
• InChiKey: VBKFRZZEICMFFH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  12
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  正丁胺 、 2,2,2-trifluoroethyl 2-nitrobenzenesulfonate 以93%的产率得到
  参考文献：
  名称：

  YAMANAKA, HIROKI;KUWABARA, MASAKI;KOMORI, MASAHIRO;OTANI, MASUO;FUKUNISHI+, J. CHEM. SOC. JAP., CHEM. AND IND. CHEM., 1984, N 4, 598-604

  摘要：

  DOI：

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND
  申请人：JSR CORPORATION

  公开号：US20150323866A1

  公开（公告）日：2015-11-12

  A radiation-sensitive resin composition contains: a polymer having a structural unit that includes a group represented by formula (1); a radiation-sensitive acid generator; and an organic solvent. In the formula (1), R P represents a hydrogen atom or a monovalent organic group, and * denotes a binding site to a rest of the structural unit other than the group represented by the formula (1). It is preferred that R P in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-nonlabile group. It is also preferred that R P in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-labile group.

  一种辐射敏感的树脂组合物包含：具有结构单元的聚合物，该结构单元包括由公式（1）表示的基团；辐射敏感的酸发生剂；和有机溶剂。在公式（1）中，RP表示氢原子或一价有机基团，*表示与公式（1）中表示的基团以外的结构单元的其余部分的结合位点。优选的是，在公式（1）中，RP表示一价有机基团，该一价有机基团是不可酸解的基团。还优选在公式（1）中，RP表示一价有机基团，该一价有机基团是可酸解的基团。
• Tetracycline Compounds
  申请人：Deng Yonghong

  公开号：US20120208788A1

  公开（公告）日：2012-08-16

  The present invention is directed to a compound represented by Structural Formula (1): or a pharmaceutically acceptable salt thereof. The variables for Structural Formula (I) are defined herein. Also described is a pharmaceutical composition comprising the compound of Structural Formula (I) and its therapeutic use.

  本发明涉及一种由结构式（1）表示的化合物或其药学上可接受的盐。结构式（I）的变量在此定义。本发明还描述了包含结构式（I）化合物的药物组合物及其治疗用途。
• N-CYCLOPROPYL-3-FLUORO-5-[3-[[1-[2-[2- [(2-HYDROXETHYL)AMINO] ETHOXY]PHENYL] CYCLOPROPYL] AMINO]-2-OXO- 1 (2H)-PYRAZINYL]-4-METHYL-BENZAMIDE, OR PHARMACEUTICALLY ACCEPTABLE SALTS THEREOF AND THEIR USES
  申请人：Brough Stephen

  公开号：US20120214822A1

  公开（公告）日：2012-08-23

  The present invention relates to pyrazinone derivatives of formula (I): wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and R 7 are as herein defined; processes for their preparation, pharmaceutical compositions containing them and their use in therapy.

  本发明涉及式（I）的吡唑酮衍生物，其中R1，R2，R3，R4，R5，R6和R7如本文所定义；其制备方法，含有它们的制药组合物，以及它们在治疗中的用途。
• PYRAZINONE DERIVATIVES, PHARMACEUTICALLY ACCEPTABLE SALTS THEREOF AND THEIR USES
  申请人：Brough Stephen

  公开号：US20130012523A1

  公开（公告）日：2013-01-10

  The present invention relates to pyrazinone derivatives of formula (I): wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and R 7 are as herein defined; processes for their preparation, pharmaceutical compositions containing them and their use in therapy.

  本发明涉及式(I)的吡嗪酮衍生物，其中R1，R2，R3，R4，R5，R6和R7如所定义;它们的制备方法，含有它们的制药组合物以及它们在治疗中的使用。
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND
  申请人：JSR Corporation

  公开号：US20140212813A1

  公开（公告）日：2014-07-31

  A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R 1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O— # or —SO 2 —O— ## , wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R 1 . -A-R 1 (x)

  一种辐射敏感的树脂组合物，包括第一聚合物，其中包括酸敏感基团，酸发生剂用于在辐射照射下产生酸，以及第二聚合物，其中包括氟原子和由一般式（x）表示的功能基团。第二聚合物的氟原子含量高于第一聚合物的氟原子含量。R1表示碱敏感基团。A表示氧原子，-NR'，-CO-O-＃或-SO2-O-##，其中由A表示的氧原子不是直接与芳香环，羰基基团或亚砜基团结合的氧原子，R'表示氢原子或碱敏感基团，“＃”和“##”分别表示与R1结合的键手。-A-R1（x）