作者:T. A. Kochina、D. V. Vrazhnov、E. N. Sinotova、I. S. Ignat’ev
DOI:10.1007/s11176-005-0303-1
日期:2005.5
The gas-phase reaction of diethylsilylium ions with hexamethyldisiloxane was studied by the radiochemical procedure. As in reactions with other nucleophiles, the degree of rearrangement of the diethylsilylium ion in the reaction with hexamethyldisiloxane correlates with the condensation energy. In contrast to the reaction of Et2SiT+ with dibutyl ether, in the reaction with hexamethyldisiloxane the labeled substrate is formed, which is due to isomerization of the trimethylsilyl substituent giving rise to a labile hydrogen atom.
通过放射化学方法研究了二乙基硅鎓离子与六甲基二硅氧烷的气相反应。与与其他亲核试剂的反应一样,与六甲基二硅氧烷反应中二乙基甲硅烷基离子的重排程度与缩合能相关。与 Et2SiT+ 与二丁基醚的反应相反,在与六甲基二硅氧烷的反应中,形成标记底物,这是由于三甲基甲硅烷基取代基的异构化产生不稳定的氢原子。