[EN] PHOTOPATTERNABLE COMPOSITIONS, PATTERNED HIGH K THIN FILM DIELECTRICS AND RELATED DEVICES<br/>[FR] COMPOSITIONS PHOTOSTRUCTURABLES, DIÉLECTRIQUES EN COUCHE MINCE DE CONSTANTE K ÉLEVÉE À MOTIFS ET DISPOSITIFS S'Y RAPPORTANT
申请人:POLYERA CORP
公开号:WO2015200872A1
公开(公告)日:2015-12-30
The present teachings relate to a photopatternable composition including a vinylidene fluoride-based polymer, a photosensitive non-nucleophilic base, and a crosslinking agent. The photopatternable composition can be used to prepare a patterned thin film component for use in an electronic, optical, or optoelectronic device such as an organic thin film transistor. The patterned thin film component can be used as a gate dielectric with a high dielectric constant, for example, a dielectric constant greater than 10.