Organoaminosilanes, such as without limitation di-iso-propylaminosilane (DIPAS), are precursors for the deposition of silicon containing films such as silicon-oxide and silicon-nitride films. Described herein are methods to make organoaminosilane compounds, or other compounds such as organoaminodisilanes and organoaminocarbosilanes, via the catalytic hydrosilylation of an imine by a silicon source comprising a hydridosilane.
Skita; Keil; Havemann, Chemische Berichte, 1933, vol. 66, p. 1400,1409
作者:Skita、Keil、Havemann
DOI:——
日期:——
Organoaminosilanes and Methods for Making Same
申请人:Versum Materials US, LLC
公开号:US20170204120A1
公开(公告)日:2017-07-20
Organoaminosilanes, such as without limitation di-iso-propylaminosilane (DIPAS), are precursors for the deposition of silicon containing films such as silicon-oxide and silicon-nitride films. Described herein are methods to make organoaminosilane compounds, or other compounds such as organoaminodisilanes and organoaminocarbosilanes, via the catalytic hydrosilylation of an imine by a silicon source comprising a hydridosilane.