2H-[1,3]噻唑并[5,4-f]吲哚 | 126581-24-6

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并噻唑类
• 中文名称: 2H-[1,3]噻唑并[5,4-f]吲哚
• 英文名称: 2H-Pyrrolo[2,3-f]benzothiazole
• 英文别名: 2H-pyrrolo[2,3-f][1,3]benzothiazole
• CAS: 126581-24-6
• 化学式: C₉H₆N₂S
• 分子量: 174.22
• InChiKey: OEHKBSICIDJOMG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.11
• 拓扑面积：
  50
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• Methine compound-containing silver halide photographic emulsion and photographic material using the same
  申请人：——

  公开号：US20020012892A1

  公开（公告）日：2002-01-31

  A silver halide photographic emulsion comprising a methine dye compound having in a molecule thereof at least one atomic group in which at least two groups selected from the group consisting of groups represented by formulas (I) and (II) are adjacent to each other or adjacent to each other through an atom: X—H (I) wherein X represents an atom electrically more negative than a carbon atom, Y  (II) wherein Y represents an atom electrically more negative than a carbon atom, and has one or more lone electron pairs; and a silver halide photographic material comprising the silver halide photographic emulsion.

  一种卤化银感光乳剂，包含一种甲基染料化合物，在其分子中至少有一个原子团，其中至少有两个选自由式(I)和(II)代表的基团组成的组的基团彼此相邻或通过一个原子彼此相邻： X-H (I) 其中 X 代表电性比碳原子更负的原子、 Y (II) 其中 Y 代表电性比碳原子更负的原子，并具有一个或多个孤电子对；以及包含卤化银感光乳剂的卤化银感光材料。
• GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD
  申请人：Kawamura Koichi

  公开号：US20090092766A1

  公开（公告）日：2009-04-09

  The invention provides a graft pattern forming method including contacting a radical-polymerizable unsaturated compound with a surface of a base material capable of generating radicals by exposure; and exposing imagewise with laser light having a wavelength of 360 to 700 nm to form a graft polymer directly bonded to the base material patternwise on the surface of the base material. The invention also provides a conductive pattern forming method including imparting conductivity to the graft pattern formed patternwise obtained by the graft pattern forming method.
• US6465166B1
  申请人：——

  公开号：US6465166B1

  公开（公告）日：2002-10-15
• US6692905B2
  申请人：——

  公开号：US6692905B2

  公开（公告）日：2004-02-17
• [EN] GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD<br/>[FR] PROCEDE DE FORMATION DE MOTIF DE GREFFE ET PROCEDE DE FORMATION DE MOTIF CONDUCTEUR
  申请人：FUJI PHOTO FILM CO LTD

  公开号：WO2006123834A2

  公开（公告）日：2006-11-23

  [EN] The invention provides a graft pattern forming method including contacting a radical-polymerizable unsaturated compound with a surface of a base material capable of generating radicals by exposure; and exposing imagewise with laser light having a wavelength of 360 to 700 nm to form a graft polymer directly bonded to the base material patternwise on the surface of the base material. The invention also provides a conductive pattern forming method including imparting conductivity to the graft pattern formed patternwise obtained by the graft pattern forming method.
  [FR] L'invention concerne un procédé de formation d'un motif de greffe qui consiste à mettre en contact un composé insaturé polymérisable par voie radicalaire avec une surface d'un matériau de base capable de produire des radicaux par exposition; et à l'exposer à une lumière laser de longueur d'onde comprise entre 360 et 700 nm sous forme d'image pour obtenir un polymère greffé directement lié au matériau de base sous forme de motif sur la surface du matériau de base. Par ailleurs, l'invention concerne un procédé de formation d'un motif conducteur qui confère au motif de greffe une conductivité électrique sous forme d'image, obtenu par le procédé de formation de motif de greffe.