METAL ALKOXIDE COMPOUND, THIN-FILM-FORMING MATERIAL, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND
申请人:ADEKA CORPORATION
公开号:US20150175642A1
公开(公告)日:2015-06-25
Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R
1
represents a methyl group or an ethyl group, R
2
represents a hydrogen atom or a methyl group, R
3
represents a C
1-3
linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.
METHOD FOR THE CONTINUOUS PRODUCTION OF AN AMINE USING AN ALUMINUM-COPPER CATALYST
申请人:Ernst Martin
公开号:US20110172430A1
公开(公告)日:2011-07-14
Process for the continuous preparation of an amine by reaction of a primary or secondary alcohol, aldehyde and/or ketone with hydrogen and a nitrogen compound selected from the group consisting of ammonia, primary and secondary amines at a temperature in the range from 60 to 300° C. in the presence of a catalyst comprising copper oxide and aluminum oxide, wherein the reaction takes place in the gas phase and the catalytically active composition of the catalyst before reduction with hydrogen comprises PS from 20 to 75% by weight of aluminum oxide (Al
2
O
3
),
from 20 to 75% by weight of oxygen-comprising compounds of copper, calculated as CuO,
from 0 to 2% by weight of oxygen-comprising compounds of sodium, calculated as Na
2
O, and
less than 5% by weight of oxygen-comprising compounds of nickel, calculated as NiO, and the shaped catalyst body has a pellet shape having a diameter in the range from 1 to 4 mm and a height in the range from 1 to 4 mm.
THIN-FILM FORMING RAW MATERIAL FOR USE IN ATOMIC LAYER DEPOSITION METHOD, THIN-FILM FORMING RAW MATERIAL, METHOD FOR PRODUCING THIN-FILM, AND COMPOUND
申请人:ADEKA CORPORATION
公开号:US20210340162A1
公开(公告)日:2021-11-04
The present invention provides a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following general formula (1):
where R
1
to R
4
each independently represent an alkyl group having 1 to 5 carbon atoms, and A
1
represents an alkanediyl group having 1 to 5 carbon atoms.
The effects of a hydroxyl group on some chemical and biological properties of n-pentyl ammonium salts
作者:R B Barlow
DOI:10.1111/j.2042-7158.1978.tb13369.x
日期:2011.4.12
The effects of a hydroxyl group on the activity and affinity of compounds related to n-pentyltrimethylammonoum have been studied on the guinea-pig ileum, frog rectus, acetylcholinesterase and on partitioning (Rm) and size (phiov, Vm). The hydroxyl group lowered affinity in all tests, confirming the importance of hydrophobic forces in binding to receptors. Activity on the ileum was lowered appreciably
Processes comprising: (i) providing a reactant selected from the group consisting of primary alcohols, secondary alcohols, aldehydes, ketones and mixtures thereof; and (ii) reacting the reactant with hydrogen and a nitrogen compound selected from the group consisting of ammonia, primary amines, secondary amines and mixtures thereof, in the presence of a catalyst comprising a zirconium dioxide- and nickel-containing catalytically active composition, to form an amine; wherein the catalytically active composition, prior to reduction with hydrogen, comprises oxygen compounds of zirconium, copper, nickel and cobalt, and one or more oxygen compounds of one or more metals selected from the group consisting of Pb, Bi, Sn, Sb and In.