摩熵化学
数据库官网
小程序
打开微信扫一扫
首页 分子通 化学资讯 化学百科 反应查询 关于我们
请输入关键词

6-sulfo-[2]naphthoic acid | 65492-66-2

中文名称
——
中文别名
——
英文名称
6-sulfo-[2]naphthoic acid
英文别名
Naphthoesaeure-(2)-sulfonsaeure-(6);6-Sulfo-[2]naphthoesaeure;6-Sulfo-2-naphthalenecarboxylic acid;6-sulfonaphthalene-2-carboxylic acid
6-sulfo-[2]naphthoic acid化学式
CAS
65492-66-2
化学式
C11H8O5S
mdl
——
分子量
252.248
InChiKey
VXKQHNSBOQPHCW-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 密度:
    1.587±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    0.2
  • 重原子数:
    17
  • 可旋转键数:
    2
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    100
  • 氢给体数:
    2
  • 氢受体数:
    5

反应信息

  • 作为反应物:
    参考文献:
    名称:
    Butler; Royle, Journal of the Chemical Society, 1923, vol. 123, p. 1652
    摘要:
    DOI:
  • 作为产物:
    描述:
    alkaline earth salt of/the/ methylsulfuric acid 在 alkaline solution 作用下, 生成 6-sulfo-[2]naphthoic acid
    参考文献:
    名称:
    Butler; Royle, Journal of the Chemical Society, 1923, vol. 123, p. 1652
    摘要:
    DOI:
点击查看最新优质反应信息

文献信息

  • Preparation of hydroxy aromatic carboxylic acids and ester derivatives thereof
    申请人:CELANESE CORPORATION
    公开号:EP0049616A1
    公开(公告)日:1982-04-14
    A process for preparing hydroxy aromatic carboxylic acids, or the ester derivatives thereof, comprises carbonylating a hydroxy aromatic halide in the presence of a reactive alcohol solvent and a catalytic amount of a Group VIII metal catalyst. The process has particular applicability to the preparation of 6-hydroxy-2-naphthoic acid from 6-bromo-2-naphthol, which can be easily prepared from β-naphthol, a readily available and inexpensive starting material.
    制备羟基芳香族羧酸或其酯类衍生物的工艺包括在活性醇溶剂和催化量的第八族金属催化剂存在下对羟基芳香族卤化物进行羰基化。 该工艺特别适用于从 6-溴-2-萘酚制备 6-羟基-2-萘酸,而 6-溴-2-萘酚很容易从β-萘酚制备,β-萘酚是一种容易获得且价格低廉的起始原料。
  • RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME
    申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
    公开号:US20170045820A1
    公开(公告)日:2017-02-16
    A composition for forming a resist underlayer film which make possible to form a desired high-adhesion resist pattern. A resist underlayer film-forming composition for lithography containing a polymer having the following structure Formula (1) or (2) at a terminal of a polymer chain, crosslinker, compound promoting crosslinking reaction, and organic solvent. (wherein R 1 is a C 1-6 alkyl group optionally having a substituent, phenyl group, pyridyl group, halogeno group, or hydroxy group, R 2 is a hydrogen atom, a C 1-6 alkyl group, hydroxy group, halogeno group, or ester group of —C(═O)O—X wherein X is a C 1-6 alkyl group optionally having a substituent, R 3 is a hydrogen atom, a C 1-6 alkyl group, hydroxy group, or halogeno group, R 4 is a direct bond or divalent C 1-8 organic group, R 5 is a divalent C 1-8 organic group, A is an aromatic ring or heteroaromatic ring, t is 0 or 1, and u is 1 or 2.)
  • US4374262A
    申请人:——
    公开号:US4374262A
    公开(公告)日:1983-02-15
  • US9910354B2
    申请人:——
    公开号:US9910354B2
    公开(公告)日:2018-03-06
  • Butler; Royle, Journal of the Chemical Society, 1923, vol. 123, p. 1652
    作者:Butler、Royle
    DOI:——
    日期:——
查看更多