PETERS, J. A.;PETERS-VAN, CRANENBURGH, P. E. J.;BOVEE, W. M. M. J.;ROZEMA+, TETRAHEDRON, 1982, 38, N 24, 3641-3647
作者:PETERS, J. A.、PETERS-VAN, CRANENBURGH, P. E. J.、BOVEE, W. M. M. J.、ROZEMA+
DOI:——
日期:——
GRAS, J. -L.;GUERIN, A., C. R. ACAD. SCI., 1985, N 6, 379-381
作者:GRAS, J. -L.、GUERIN, A.
DOI:——
日期:——
PHOTORESIST COMPOSITION
申请人:MASUYAMA Tatsuro
公开号:US20110065040A1
公开(公告)日:2011-03-17
The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I):
wherein R
1
represents a C2-C12 alkyl group which can have one or more hydroxyl groups, etc.,
R
2
and R
3
each independently represent a hydrogen atom, etc.,
R
4
, R
5
and R
6
each independently represent a hydrogen atom, etc.,
A
1
represents a single bond or a C1-C2 alkylene group in which one or more —CH
2
— can be replaced by —O—.