1-Nonadecanaminium, N,N,N-trimethyl-, bromide | 879685-36-6

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: 1-Nonadecanaminium, N,N,N-trimethyl-, bromide
• 英文别名: trimethyl(nonadecyl)azanium;bromide
• CAS: 879685-36-6
• 化学式: C22H48BrN
• 分子量: 406.5
• InChiKey: BGGPPIRDKCLJKP-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  4.35
• 重原子数：
  24
• 可旋转键数：
  18
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• CLEANING LIQUID FOR MATERIAL COMPRISING CARBON-CONTAINING SILICON OXIDE FOR WAFER RECYCLING, AND CLEANING METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3285285A1

  公开（公告）日：2018-02-21

  It is an object of the present invention to provide a cleaning solution for removing carbon-incorporated silicon oxide (SiOC) from the surface of a wafer in a step of producing a wafer having a material comprising the SiOC, and a cleaning method of using the same. The cleaning solution of the present invention comprises 2% by mass to 30% by mass of a fluorine compound, 0.0001% by mass to 20% by mass of a specific cationic surfactant that is an ammonium salt or an amine, and water, and has a pH value of 0 to 4.

  本发明的目的是提供一种清洗液，用于在生产具有包含氧化硅（SiOC）的材料的晶片的步骤中去除晶片表面的碳结合氧化硅（SiOC），以及使用该清洗液的清洗方法。本发明的清洗液由质量分数为 2% 至 30% 的氟化合物、质量分数为 0.0001% 至 20% 的特定阳离子表面活性剂（铵盐或胺）和水组成，pH 值为 0 至 4。
• ANTI-GEL AGENT FOR POLYHYDROXYETHERAMINES, GEL STABILIZED POLYHYDROXYETHERAMINE SOLUTIONS, AND METHODS FOR MAKING AND USING SAME
  申请人：CLEARWATER INTERNATIONAL, LLC

  公开号：US20150197682A1

  公开（公告）日：2015-07-16

  Anti-gel agents for polyhydroxyetheramines/copolyhydroxyetheramines and gel stabilized polyhydroxyetheramine/copolyhydroxyetheramine solutions including a polymer system including polyhydroxyetheramines and/or copolyhydroxyetheramines and an anti-gel system including quaternary ammonium compounds, quaternary phosphonium compounds, or mixtures and combinations.
• CLEANING SOLUTION AND CLEANING METHOD FOR MATERIAL COMPRISING CARBON-INCORPORATED SILICON OXIDE FOR USE IN RECYCLING WAFER
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：US20180087006A1

  公开（公告）日：2018-03-29

  It is an object of the present invention to provide a cleaning solution for removing carbon-incorporated silicon oxide (SiOC) from the surface of a wafer in a step of producing a wafer having a material comprising the SiOC, and a cleaning method of using the same. The cleaning solution of the present invention comprises 2% by mass to 30% by mass of a fluorine compound, 0.0001% by mass to 20% by mass of a specific cationic surfactant that is an ammonium salt or an amine, and water, and has a pH value of 0 to 4.
• [EN] ANTI-GEL AGENT FOR POLYHYDROXYETHERAMINES, GEL STABILIZED POLYHYDROXYAMINOETHER SOLUTIONS, AND METHODS FOR MAKING AND USING SAME<br/>[FR] AGENT ANTIGEL POUR POLYHYDROXYÉTHERAMINES, SOLUTIONS DE POLYHYDROXYAMINOÉTHER STABILISÉES PAR GEL, ET LEURS PROCÉDÉS DE FABRICATION ET D'UTILISATION
  申请人：CLEARWATER INT LLC

  公开号：WO2015107490A1

  公开（公告）日：2015-07-23

  Anti-gel agents for polyhydroxyetheramines/copolyhydroxyetheramines and gel stabilized polyhydroxyetheramine/copolyhydroxyetheramine solutions including a polymer system including polyhydroxyetheramines and/or copolyhydroxyetheramines and an anti-gel system including quaternary ammonium compounds, quaternary phosphonium compounds, or mixtures and combinations.