甲基镓 | 99601-83-9

• 分子结构分类: 有机化合物
• 中文名称: 甲基镓
• 英文名称: methylgallium(I)
• 英文别名: monomethyl gallium；Gallium, methyl-
• CAS: 99601-83-9
• 化学式: CH₃Ga
• 分子量: 84.7578
• InChiKey: JOTBHEPHROWQDJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  2
• 可旋转键数：
  0
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为产物：
  描述：

  二甲基镓氢化物 以 not given 为溶剂， 生成 甲基镓 、 三甲基镓
  参考文献：
  名称：

  二甲基gallane的合成和性质：通过电子衍射确定的气相中二聚体Me 2 Ga（µ-H）2 GaMe 2的结构

  摘要：

  由三甲基没食子酸酯和四氢没食子酸钠反应最好地合成的二甲基没食子酸酯具有光谱和化学性质。电子衍射已经确定了二聚体Me 2 Ga（µ-H）2 GaMe 2的结构，Me 2 Ga（µ-H）2 GaMe 2是低压下的主要蒸气物质。

  DOI：

  10.1039/c39860000805

文献信息

• Laser photolysis of trimethylgallium at 193 nm: Quantum yields for methyl radical and ethane production
  作者：W. Braun、R. Klein、A. Fahr、H. Okabe、A. Mele

  DOI：10.1016/0009-2614(90)85050-m

  日期：1990.3

  products from trimethylgallium (TMG) photolysis were determined via a new method involving isotopic analysis using TMG-acetone-d6 mixtures. The following model-dependent quantum yields were obtained: monomethylgallium (MMG), 0.5; dimethylgallium (DMG), 0.2; gallium, 0.3; molecularly eliminated ethane, 0.3; free methyl, 1.5. Two new electronic absorptions at 216 and 220 nm were found and are tentatively ascribed

  三甲基镓（TMG）光解产物的量子产率是通过一种新的方法确定的，该方法涉及使用TMG-丙酮-d 6混合物进行同位素分析。获得了以下与模型有关的量子产率：单甲基镓（MMG），0.5；单甲基镓（MMG），0.5。二甲基镓（DMG），0.2；镓0.3; 分子消除的乙烷0.3; 游离甲基1.5。发现了在216和220 nm处的两种新的电子吸收，并暂时归因于DMG *。
• Matrix Photochemistry of Gallium and Indium Atoms (M) in the Presence of Methane:  Formation and Characterization of the Divalent Species CH₃MH and Univalent Species CH₃M
  作者：Hans-Jörg Himmel、Anthony J. Downs、Tim M. Greene、Lester Andrews

  DOI：10.1021/om990905p

  日期：2000.3.1

  with those forecast by DFT calculations. Photoexcitation at λ = 200−400 nm results in insertion of the group 13 metal atom into a C−H bond to form the angular monomethylmetal hydride molecule, CH3MH (M = Ga, In). This product is not photostable but decomposes on exposure to radiation with λ = 200−800 nm to give the first sighting of CH3M, the simplest organic derivative of Ga(I) and In(I) to be characterized

  IR和UV / Vis光谱测量已用于通过照射含镓或铟原子的甲烷掺杂氩气矩阵来制图设定的反应，首先用λ= 200-400 nm的光，然后用宽带UV-可见光辐照光。根据D和13 C取代，并与相关分子的振动特性或通过DFT计算预测的振动特性进行比较，对IR吸收带进行了分配，并对其载体进行了表征。在λ= 200-400 nm处进行光激发会导致第13组金属原子插入C H键中，形成有角一甲基金属氢化物分子CH 3MH（M ＝ Ga，In）。该产物不是光稳定的，但是在暴露于λ= 200-800 nm的辐射下会分解，从而首次发现CH 3 M，这是迄今为止表征的最简单的Ga（I）和In（I）有机衍生物。将CH 3 MH和CH 3 M物种的振动特性与相关分子的振动特性进行比较，并分析它们发出的具有Mc和MH键特征的光。
• Photolysis of group III (Al, Ga, In) trimethyl compounds: Detection of organic photofragments CH3 and C2H6 by picosecond laser mass spectroscopy
  作者：Th. Beuermann、M. Stuke

  DOI：10.1016/0009-2614(91)87056-h

  日期：1991.3

  The metal alkyls trimethylaluminum (TMA), trimethylgallium (TMG) and trimethylindium (TMI) were decomposed under collision-free conditions by tunable UV laser light in the range 190-310 nm and the photoproducts detected by laser mass spectroscopy using short and ultrashort laser pulses. At moderate laser fluences, these compounds decompose via a one-photon process. The simple separation of one or two methyl ligands leads to the metal-dimethyl radical (Al(CH3)2, Ga(CH3)2, In(CH3)2), and the metal-monomethyl radical (AlCH3, GaCH3, InCH3) as photoproducts. The vibronically excited metal-dimethyl radical can further decay - without the absorption of additional photons - into the metal atom plus ethane molecule. This has been proved for the first time by laser mass-spectroscopic detection of the ethane molecule as being a direct photoproduct of the investigated trialkyls. The quantum yields for the wavelength-dependent fragmentation are presented.
• Muller, Jens; Sternkicker, Henning; Bergmann, Ulf, Journal of Physical Chemistry A, 2000, vol. 104, # 16, p. 3627 - 3634
  作者：Muller, Jens、Sternkicker, Henning、Bergmann, Ulf、Atakan, Burak

  DOI：——

  日期：——