RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION-CONTROLLING AGENT
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US20220011665A1
公开(公告)日:2022-01-13
A resist composition that contains a base material component exhibiting changed solubility in a developing solution under action of acid and a compound (D0) represented by General Formula (d0), in which R
01
, R
02
, R
03
, and R
04
each independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group; alternatively, R
01
and R
02
, R
02
and R
03
, or R
03
and R
04
are bonded to each other to form an aromatic ring; R
05
represents a hydrogen atom or an alkyl group; Y represents a group that forms an alicyclic group together with a carbon atom *C; provided that at least one of the carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group; m represents an integer of 1 or more, and M
m+
represents an m-valent organic cation