2-tert-butoxycarbonylbicyclo<2.2.1>-2,5-heptadiene | 195315-08-3

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-tert-butoxycarbonylbicyclo<2.2.1>-2,5-heptadiene
• 英文别名: Tert-butyl bicyclo[2.2.1]hepta-2,5-diene-2-carboxylate
• CAS: 195315-08-3
• 化学式: C₁₂H₁₆O₂
• 分子量: 192.258
• InChiKey: OBRQPLUPQGLJLH-UHFFFAOYSA-N

物化性质

• 沸点：
  255.0±29.0 °C(Predicted)
• 密度：
  1.086±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  14
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.58
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  2-tert-butoxycarbonylbicyclo<2.2.1>-2,5-heptadiene 在 偶氮二异丁腈 、 三氯溴甲烷 作用下， 反应 5.0h， 以9%的产率得到
  参考文献：
  名称：

  Polymers for 193-nm Microlithography: Regioregular 2-Alkoxycarbonylnortricyclene Polymers by Controlled Cyclopolymerization of Bulky Ester Derivatives of Norbornadiene

  摘要：

  Double duty for the tert-butyl residue: The bulky substituent in monomer 1 favors free-radical cyclopolymerization with maleic anhydride to give the regioregular nortricyclene copolymer 2. When the polymer is irradiated with a photoacid generator, the tert-butyl ester is cleaved and the polymer becomes soluble in aqueous base. This type of copolymer can be used in 193-nm microlithography; images with resolutions of less than 200 nm have been obtained.

  DOI：

  10.1002/(sici)1521-3773(19980316)37:5<667::aid-anie667>3.0.co;2-h
• 作为产物：
  描述：

  叔丁基丙炔酸酯 、 环戊二烯 以 苯 为溶剂， 反应 24.0h， 以72%的产率得到2-tert-butoxycarbonylbicyclo<2.2.1>-2,5-heptadiene
  参考文献：
  名称：

  Polymers for 193-nm Microlithography: Regioregular 2-Alkoxycarbonylnortricyclene Polymers by Controlled Cyclopolymerization of Bulky Ester Derivatives of Norbornadiene

  摘要：

  Double duty for the tert-butyl residue: The bulky substituent in monomer 1 favors free-radical cyclopolymerization with maleic anhydride to give the regioregular nortricyclene copolymer 2. When the polymer is irradiated with a photoacid generator, the tert-butyl ester is cleaved and the polymer becomes soluble in aqueous base. This type of copolymer can be used in 193-nm microlithography; images with resolutions of less than 200 nm have been obtained.

  DOI：

  10.1002/(sici)1521-3773(19980316)37:5<667::aid-anie667>3.0.co;2-h

文献信息

• Positive tone photosensitive compositions containing amic acid as latent base catalyst
  申请人：PROMERUS, LLC

  公开号：US11061328B2

  公开（公告）日：2021-07-13

  Embodiments in accordance with the present invention encompass photosensitive compositions containing a base soluble polymer, a latent base catalyst, a photoactive compound and an epoxy crosslinking agent. The compositions are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. In some embodiments the compositions of this invention are shown to feature excellent hitherto unachievable mechanical properties. More specifically, the compositions exhibit increased photo speed, higher elongation to break, higher tensile strength and higher glass transitions temperatures than the conventional compositions, among other enhanced properties. Accordingly, the positive images formed therefrom exhibit improved thermo-mechanical properties, among other property enhancements.

  根据本发明的实施方案，光敏组合物含有基溶性聚合物、潜基催化剂、光活性化合物和环氧交联剂。这些组合物可用于形成可图案化的薄膜，以创建微电子器件、微电子封装、微机电系统、光电子器件和显示器的结构。在某些实施方案中，本发明的组合物具有迄今为止无法实现的优异机械性能。更具体地说，与传统组合物相比，本发明组合物具有更高的光速、更高的断裂伸长率、更高的拉伸强度和更高的玻璃转化温度，以及其他更强的性能。因此，由其形成的正像除其他性能增强外，还具有更好的热机械性能。
• POLYMERS DERIVED FROM NORBORNADIENE AND MALEIC ANHYDRIDE AND USE THEREOF
  申请人：PROMERUS, LLC

  公开号：US20170190810A1

  公开（公告）日：2017-07-06

  Embodiments encompassing a series of compositions containing polymers of norbornadiene and maleic anhydride monomers which are useful in forming a variety of photopatternable structures are disclosed and claimed. The compositions are useful as permanent dielectric materials. More specifically, embodiments encompassing compositions containing a series of ter- and tetrapolymers of a variety of norbornadiene, maleic anhydride, maleimide and norbornene-type cycloolefinic monomers in which maleic anhydride is fully or partially hydrolyzed (i.e., ring opened and fully or partially esterified), and a photoactive compound are disclosed, which are useful in forming permanent dielectric materials having utility in a variety of electronic material applications, among various other uses.
• POSITIVE TONE PHOTOSENSITIVE COMPOSITIONS CONTAINING AMIC ACID AS LATENT BASE CATALYST
  申请人：PROMERUS, LLC

  公开号：US20200363722A1

  公开（公告）日：2020-11-19

  Embodiments in accordance with the present invention encompass photosensitive compositions containing a base soluble polymer, a latent base catalyst, a photoactive compound and an epoxy crosslinking agent. The compositions are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. In some embodiments the compositions of this invention are shown to feature excellent hitherto unachievable mechanical properties. More specifically, the compositions exhibit increased photo speed, higher elongation to break, higher tensile strength and higher glass transitions temperatures than the conventional compositions, among other enhanced properties. Accordingly, the positive images formed therefrom exhibit improved thermo-mechanical properties, among other property enhancements.
• US6013413A
  申请人：——

  公开号：US6013413A

  公开（公告）日：2000-01-11
• US9834627B2
  申请人：——

  公开号：US9834627B2

  公开（公告）日：2017-12-05