The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition.
The photosensitive resin is represented by the following formula (1):
(wherein n represents a mean polymerization degree and is 5 or more; R1 and R2, which may be identical to or different from each other, each represent an alkylene group, an arylene group, an oxyalkylene group, or a single bond; each of X and Y represents a photosensitive unit represented by the following formula (2):
or either one of X and Y represents a photosensitive unit represented by the above formula (2) and the other represents an amino group; R3 represents a group selected from among the groups represented by the following formula set (3):
R4 represents a group selected from among the groups represented by the following formula set (4):
at least one of R3 and R4 has at least one azido group; and R5 represents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom).
本发明提供了一种通过光交联容易形成具有亲
水性和高
生物适应性的表面涂层的光敏
树脂;一种含有该光敏
树脂的光敏组合物;以及一种由该光敏组合物获得的光交联结构。
光敏
树脂用下式(1)表示:
(其中 n 代表平均聚合度,且为 5 或更多;R1 和 R2(它们可以彼此相同或不同)各自代表亚 烷基、芳烯基、氧烷基或单键;X 和 Y 各自代表由下式(2)表示的光敏单元:
或 X 和 Y 中的一个代表上式(2)所代表的光敏单元,另一个代表
氨基; R3 代表从下式(3)所代表的基团中选出的一个基团:
R4 代表从下式组 (4) 所代表的基团中选出的基团:
R3 和 R4 中至少有一个具有至少一个
叠氮基团;以及 R5 代表氢原子、烷基、含
缩醛基团的烷基、芳基、芳烷基或含有形成碱基的氮原子的取代基)。