2-[(Pentafluoropropanoyl)oxy]ethyl methacrylate | 938459-25-7

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: 2-[(Pentafluoropropanoyl)oxy]ethyl methacrylate
• 英文别名: 2-(2,2,3,3,3-pentafluoropropanoyloxy)ethyl 2-methylprop-2-enoate
• CAS: 938459-25-7
• 化学式: C₉H₉F₅O₄
• 分子量: 276.16
• InChiKey: YJQICTHKIWCNDO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  18
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.56
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  甲基丙烯酸羟乙酯 、 五氟丙酸 在 N,N-二甲基吡啶-1-胺 、 盐酸-N-乙基-Nˊ-(3-二甲氨基丙基)碳二亚胺 作用下， 以 二氯甲烷 为溶剂， 生成 2-[(Pentafluoropropanoyl)oxy]ethyl methacrylate
  参考文献：
  名称：

  TW2023/32672

  摘要：

  公开号：

文献信息

• PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160195809A1

  公开（公告）日：2016-07-07

  A photoresist composition comprising a resin having an acid-labile group; a salt represented by the formula (I); and a salt represented by the formula (B1).

  一种包括具有酸敏基团的树脂、由化学式（I）表示的盐以及由化学式（B1）表示的盐的光刻胶组合物。
• SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：ANRYU Yukako

  公开号：US20120328986A1

  公开（公告）日：2012-12-27

  A salt represented by formula (I): wherein Q 1 and Q 2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, L l represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that L l is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, R l represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z + represents an organic cation.

  一种用化学式(I)表示的盐：其中Q1和Q2分别表示氟原子或C1-C6全氟烷基基团，n表示0或1，Ll表示单键或C1-C10脂肪二基团，其中一个亚甲基基团可被氧原子或羰基取代，但当n为0时，Ll不是单键，环W表示C3-C36脂肪环，其中一个亚甲基基团可被氧原子、硫原子、羰基或磺酰基取代，氢原子可被氢氧基、C1-C12烷基基团或C1-C12烷氧基取代，Rl表示氢氧基或受保护的氢氧基，Z+表示有机阳离子。
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20170247323A1

  公开（公告）日：2017-08-31

  A salt having a group represented by the formula (aa): wherein X a and X b independently each represent an oxygen atom or a sulfur atom, the ring W represents a C3-C36 heterocyclic ring which has an ester bond or a thioester bond, said heterocyclic ring optionally further having an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group each by which a methylene group has been replaced, and said heterocycilic ring optionally having a hydroxyl group, a cyano group, a carboxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C2-C13 alkoxycarbonyl group, a C2-C13 acyl group, a C2-C13 acyloxy group, a C3-C12 alicyclic hydrocarbon group, a C6-C10 aromatic hydrocarbon group or any combination of these groups each by which a hydrogen atom has been replaced, and * represents a binding position.

  一种盐，其具有由公式（aa）表示的基团：其中Xa和Xb独立地代表一个氧原子或一个硫原子，环W代表一个具有酯键或硫酯键的C3-C36杂环环，该杂环环还可以进一步具有一个氧原子、一个硫原子、一个羰基或一个磺酰基，其中每个都已被一个亚甲基取代，该杂环环还可以具有一个羟基、一个氰基、一个羧基、一个C1-C12烷基、一个C1-C12烷氧基、一个C2-C13烷氧羰基、一个C2-C13酰基、一个C2-C13酰氧基、一个C3-C12脂环烃基、一个C6-C10芳香烃基或任何组合，其中每个都已被氢原子取代，*表示一个结合位置。
• SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：YOSHIDA Isao

  公开号：US20130052588A1

  公开（公告）日：2013-02-28

  A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q 1 , Q 2 , L 1 , W 1 , W 2 , R 1 , R 2 , t1 and t2 are defined in the specification, and Z + represents an organic cation.

  一种光刻胶组合物，包含一种树脂，该树脂几乎不溶解或不溶解，但在酸的作用下可溶解于水性碱溶液中，并且包含由式(I)表示的盐：其中Q1、Q2、L1、W1、W2、R1、R2、t1和t2在规范中定义，Z+代表有机阳离子。
• COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：ICHIKAWA Koji

  公开号：US20120295201A1

  公开（公告）日：2012-11-22

  A compound represented by formula (I): wherein T 1 represents a single bond or a C6-C14 aromatic hydrocarbon group, L 1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L 2 and L 3 each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W 1 and ring W 2 each independently represent a C3-C36 hydrocarbon ring, R 1 and R 2 each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group, R 3 and R 4 each independently represent a hydroxyl group, or C1-C6 alkyl group, R 5 represents a hydroxyl group or a methyl group, m represents 0 or 1, and t and u each independently represent an integer of 0 to 2.

  一个由化学式(I)表示的化合物：其中T1代表一个单键或一个C6-C14芳香烃基，L1代表一个C1-C17二价饱和碳氢基团，其中一个亚甲基基团可以被氧原子或羰基所取代，L2和L3分别独立地代表一个单键或一个C1-C6二价饱和碳氢基团，其中一个亚甲基基团可以被氧原子或羰基所取代，环W1和环W2分别独立地代表一个C3-C36碳氢环，R1和R2分别独立地代表一个氢原子、一个羟基或一个C1-C6烷基基团，R3和R4分别独立地代表一个羟基或一个C1-C6烷基基团，R5代表一个羟基或一个甲基基团，m代表0或1，t和u分别独立地代表0到2之间的整数。