An aqueous polishing composition has been found, the said aqueous polishing composition comprising
(A) at least one type of abrasive particles which are positively charged when dispersed in an aqueous medium free from component (B) and having a pH in the range of from 3 to 9 as evidenced by the electrophoretic mobility;
(B) at least one water-soluble polymer selected from the group consisting of linear and branched alkylene oxide homopolymers and copolymers; and
(C) at least one anionic phosphate dispersing agent;
and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.
发现了一种
水性抛光组合物,所述
水性抛光组合物包括
(A) 至少一种磨料颗粒,分散在不含组分(B)的
水介质中时带正电,从电泳迁移率看,其 pH 值在 3 至 9 之间;
(B) 至少一种
水溶性聚合物,选自由线性和支链环氧亚烷基均聚物和共聚物组成的 组;以及
(C) 至少一种阴离子
磷酸盐分散剂;
以及一种利用该
水性抛光组合物对电气、机械和光学设备的基底材料进行抛光的工艺。