1-(4-Chlorophenyl)-2-(4-methoxynaphthalen-1-yl)-1,1,2,2-tetraoxo-1lambda~6~,2lambda~6~-disulfane | 176109-33-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 1-(4-Chlorophenyl)-2-(4-methoxynaphthalen-1-yl)-1,1,2,2-tetraoxo-1lambda~6~,2lambda~6~-disulfane
• 英文别名: 1-(4-chlorophenyl)sulfonylsulfonyl-4-methoxynaphthalene
• CAS: 176109-33-4
• 化学式: C₁₇H₁₃ClO₅S₂
• 分子量: 396.9
• InChiKey: XRYGPIJWSKIKIG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.1
• 重原子数：
  25
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.06
• 拓扑面积：
  94.3
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• Positive photosensitive composition
  申请人：Kodama Kunihiko

  公开号：US20070003871A1

  公开（公告）日：2007-01-04

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.

  一种正性光敏组合物包括一种化合物，该化合物能够在接受活性光线或辐射照射后产生一种指定的磺酸，并且（B）一种树脂，该树脂在酸作用下分解以增加在碱性显影剂中的溶解度。
• POSITIVE RESIN COMPOSITION OF NEAR-INFRARED-RAY ACTIVATION TYPE
  申请人：KANSAI PAINT CO., LTD.

  公开号：EP1788432A1

  公开（公告）日：2007-05-23

  A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.

  一种近红外射线活化型正抗蚀剂组合物，包括 (A) 乙烯基聚合物，其单体单元具有碱溶性基团，该基团被醚封住，醚氧旁边具有烯基、 (B) 通过近红外区域的光产生热量的光热转换物质、 (C) 通过热量产生酸的热酸发生器、 本发明可提供一种近红外射线活化型正抗蚀剂组合物，该组合物可在完全明亮的室内（如在白光等下）进行曝光处理，可获得所需的灵敏度和分辨率，其烘烤处理条件可放宽或省略烘烤处理，还可提供使用该组合物的图案形成方法。
• Negative-working resist composition
  申请人：FUJIFILM Corporation

  公开号：EP1117002B1

  公开（公告）日：2010-04-14
• Near Infrared Ray Activation Type Positive Resin Composition
  申请人：Imai Genji

  公开号：US20070259279A1

  公开（公告）日：2007-11-08

  A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.
• Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same
  申请人：Imai Genji

  公开号：US20090045552A1

  公开（公告）日：2009-02-19

  Provided are a positive resist composition for recording medium master showing excellent plating resistance and adhesion to a base plate such as glass or the like characterized by containing a vinyl polymer which has a monomer unit having an alkali-soluble group blocked by an alkyl vinyl ether, and a method of producing a recording medium master or stamper using this positive resist composition.