N-(2-isopropoxy-ethyl)-aniline | 100054-34-0

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: N-(2-isopropoxy-ethyl)-aniline
• 英文别名: N-(2-Isopropoxy-aethyl)-anilin；N-{2-[(Propan-2-yl)oxy]ethyl}aniline；N-(2-propan-2-yloxyethyl)aniline
• CAS: 100054-34-0
• 化学式: C₁₁H₁₇NO
• mdl: MFCD14645732
• 分子量: 179.262
• InChiKey: LJPICRWPKJNFFL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  13
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.454
• 拓扑面积：
  21.3
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• MATERIAL FOR FORMING UNDERLAYER FILMS FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILMS FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, PATTERN FORMING METHOD, RESIN, AND PURIFICATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3346335A1

  公开（公告）日：2018-07-11

  The present embodiment provides a material for forming an underlayer film for lithography, containing at least any of a compound represented by following formula (1) or a resin including a structural unit derived from a compound represented by the following formula (1), wherein R1 represents a 2n-valent group having 1 to 60 carbon atoms, or a single bond, each R2 independently represents a halogen atom, a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group, a hydroxyl group, or a group where a hydrogen atom of a hydroxyl group is substituted with an acid-dissociable group, and may be the same or different in the same naphthalene ring or benzene ring, in which at least one R2 represents a group where a hydrogen atom of a hydroxyl group is substituted with an acid-dissociable group, n is an integer of 1 to 4, and structural formulae of n structural units in square brackets [] may be the same or different when n is an integer of 2 or more, X represents an oxygen atom, a sulfur atom, or an uncrosslinked state, each m2 is independently an integer of 0 to 7, provided that at least one m2 is an integer of 1 to 7, and each q is independently 0 or 1.

  本实施例提供了一种用于形成光刻用底层薄膜的材料，该材料至少含有下式（1）所代表的化合物中的任何一种，或包括由下式（1）所代表的化合物衍生出的结构单元的树脂、 其中 R1 代表具有 1 至 60 个碳原子的 2n 价基团或单键，每个 R2 独立地代表卤素原子、具有 1 至 10 个碳原子的直链、支链或环链烷基、具有 6 至 10 个碳原子的芳基、具有 2 至 10 个碳原子的烯基、具有 1 至 30 个碳原子的烷氧基、硫醇基、羟基或羟基的氢原子被酸分解基团取代的基团，这些基团在同一个萘环或苯环中可以相同或不同、其中至少一个 R2 代表羟基的氢原子被可酸水解基团取代的基团，n 为 1 至 4 的整数，当 n 为 2 或 2 以上的整数时，方括号[]中 n 个结构单元的结构式可以相同或不同，X 代表氧原子、硫原子或未交联状态，每个 m2 独立地为 0 至 7 的整数，条件是至少一个 m2 为 1 至 7 的整数，每个 q 独立地为 0 或 1。