ortho-Hydroxylation of phenols. Part IV. Pyrogallols
作者:J. D. Loudon、L. A. Summers
DOI:10.1039/jr9540001134
日期:——
TREATMENT FLUID
申请人:FUJIFILM Corporation
公开号:US20210005473A1
公开(公告)日:2021-01-07
The present invention provides a treatment liquid for a semiconductor device, which has excellent temporal stability of residue removal performance as well as excellent anticorrosion performance for an object to be treated. The treatment liquid of an aspect of the present invention is a treatment liquid for a semiconductor device contains one or more hydroxylamine compounds selected from the group consisting of hydroxylamine and a hydroxylamine salt, an organic basic compound, an alcohol-based solvent, and a surfactant, in which a content of the alcohol-based solvent with respect to a total mass of the treatment liquid is 40% to 85% by mass, and a pH is 8 or higher.
[EN] TREATMENT FLUID<br/>[FR] FLUIDE DE TRAITEMENT<br/>[JA] 処理液