2-[2-(2-oxo-2,3-dihydrobenzoxazol-6-yl-carbamoyl)ethyl]-5-[3-(4-trifluoromethylphenyl)-ureido]-1H-imidazole-4-carboxylic acid | 1143506-87-9

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并恶唑类
• 英文名称: 2-[2-(2-oxo-2,3-dihydrobenzoxazol-6-yl-carbamoyl)ethyl]-5-[3-(4-trifluoromethylphenyl)-ureido]-1H-imidazole-4-carboxylic acid
• 英文别名: 2-[3-oxo-3-[(2-oxo-3H-1,3-benzoxazol-6-yl)amino]propyl]-4-[[4-(trifluoromethyl)phenyl]carbamoylamino]-1H-imidazole-5-carboxylic acid
• CAS: 1143506-87-9
• 化学式: C₂₂H₁₇F₃N₆O₆
• 分子量: 518.409
• InChiKey: NMURVANSNWVJNA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  37
• 可旋转键数：
  7
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  175
• 氢给体数：
  6
• 氢受体数：
  10

文献信息

• IMIDAZOLE DERIVATIVES
  申请人：Schultz Melanie

  公开号：US20100249132A1

  公开（公告）日：2010-09-30

  Compounds of the formula (I), in which R 1 , D, E, L, Q, X and q have the meanings indicated in Claim 1, can and be employed for the treatment of tumours.

  式(I)中的化合物，其中R1、D、E、L、Q、X和q具有权利要求1中所示的含义，可用于治疗肿瘤。
• Composition for antireflection coating and method for forming pattern
  申请人：Akiyama Yasushi

  公开号：US20050239932A1

  公开（公告）日：2005-10-27

  An anti-reflective coating film is formed by applying on a chemically amplified photoresist film an anti-reflective coating composition comprising an alkali-soluble fluorine-containing polymer, an acid, an amine and a solvent capable of dissolving these components and having a pH of 7 or less. The formed anti-reflective coating film can serve to prevent multiple reflections within the photoresist film, increase the amount of reduction in thickness of the photoresist film upon development with a developer after exposure, and form a pattern having a rectangular cross-sectional pattern and not having T-top or round top.

  通过在化学放大的光刻胶膜上涂敷由碱溶性含氟聚合物、酸、胺和能溶解这些成分且 pH 值小于或等于 7 的溶剂组成的防反射涂层组合物，可形成防反射涂层膜。形成的防反射涂膜可防止光刻胶膜内的多重反射，增加曝光后用显影剂显影时光刻胶膜厚度的减少量，并形成具有矩形横截面图案而不具有 T 形顶或圆形顶的图案。
• IMIDAZOLDERIVATE
  申请人：Merck Patent GmbH

  公开号：EP2193122B1

  公开（公告）日：2016-08-03
• COMPOSITION FOR FORMATION OF TOP ANTIREFLECTIVE FILM, AND PATTERN FORMATION METHOD USING THE COMPOSITION
  申请人：Akiyama Yasushi

  公开号：US20100286318A1

  公开（公告）日：2010-11-11

  Disclosed is a composition for forming a top antireflective film, which comprises at least one fluorine-containing compound and a quaternary ammonium compound represented by the formula (1) [wherein at least one of R 1 , R 2 , R 3 , and R 4 represents a hydroxyl group or an alkanol group, and the others independently represent a hydrogen or an alkyl group having 1 to 10 carbon atoms; and X − represents a hydroxyl group, a halide ion or a sulfate ion], and optionally a water-soluble polymer, an acid, a surfactant and an aqueous solvent. The composition for forming a top antireflective film can exhibit the same levels of functions as those of conventional top antireflective film-forming compositions when applied in a smaller amount.
• US7365115B2
  申请人：——

  公开号：US7365115B2

  公开（公告）日：2008-04-29