Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.
本研究提供了新型 N-烷基取代的过氢环状
硅烷、低聚 N-烷基过氢
硅烷化合物和 N-烷基
氨基二氢卤代
硅烷及其合成方法。这些新型化合物可用于通过热或等离子诱导分解形成高
氮化硅含量的薄膜。