N,N'-Methylen-bis-naphthalimid | 10245-48-4

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 异喹啉及其衍生物
• 英文名称: N,N'-Methylen-bis-naphthalimid
• 英文别名: 2,2'-methanediyl-bis-benzo[de]isoquinoline-1,3-dione；2-[(1,3-Dioxobenzo[de]isoquinolin-2-yl)methyl]benzo[de]isoquinoline-1,3-dione
• CAS: 10245-48-4
• 化学式: C₂₅H₁₄N₂O₄
• 分子量: 406.397
• InChiKey: RKIHWCYSUZBHJE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  31
• 可旋转键数：
  2
• 环数：
  6.0
• sp3杂化的碳原子比例：
  0.04
• 拓扑面积：
  74.8
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition
  申请人：SAKAYORI Katsuya

  公开号：US20080275154A1

  公开（公告）日：2008-11-06

  The present invention provides a radical generator having a naphthalimide structure or a crosslinking agent and a photosensitive compound having a function as a radical generator. A photoradical polymerization initiator of the present invention comprises a compound (a) having only one naphthalimide structure-containing group in one molecule. The radial generator of the present invention comprises a compound (c) having two or more naphthalimide structure-containing groups in one molecule and also functions as a crosslinking agent. A first photosensitive compound of the present invention comprises a compound (d) having a naphthalimide structure-containing group and an ethylenic unsaturated group in one molecule. A second photosensitive compound of the present invention comprises a polymer (e) of one or more radical polymerizable compounds containing the compound (d). A photosensitive resin composition according to the present invention contains, as an essential component, the above compound (a), compound (c), compound (d) or polymer (e).
• US7410746B2
  申请人：——

  公开号：US7410746B2

  公开（公告）日：2008-08-12
• US8211613B2
  申请人：——

  公开号：US8211613B2

  公开（公告）日：2012-07-03