PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE
申请人:FUJIFILM CORPORATION
公开号:US20160018734A1
公开(公告)日:2016-01-21
There is provided a pattern forming method comprising (a) a step of forming a film on a substrate using an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, (b) a step of forming a top coat layer on the film using a top coat composition containing a resin (T) containing at least any one of repeating units represented by formulae (I-1) to (I-5) shown below, (c) a step of exposing the film having the top coat layer using an electron beam or an extreme ultraviolet radiation, and (d) a step of developing the film having the top coat layer after the exposure to form a pattern.
Aromatic sulfonation. 90. Sulfonation of three symmetrical 2,6-dialkylphenols, 2,6-dimethylanisole. Sulfation and sulfonation product distributions and mechanisms
作者:Hans Cerfontain、Ankie Koeberg-Telder、Hans J. A. Lambrechts、Peter De Wit
DOI:10.1021/jo00199a034
日期:1984.12
US9915870B2
申请人:——
公开号:US9915870B2
公开(公告)日:2018-03-13
CERFONTAIN, H.;KOEBERG-TELDER, A.;LAMBRECHTS, H. J. A.;DE, WIT, P., J. ORG. CHEM., 1984, 49, N 25, 4917-4923
作者:CERFONTAIN, H.、KOEBERG-TELDER, A.、LAMBRECHTS, H. J. A.、DE, WIT, P.