2-methoxy-3-ethenylnaphthlane | 220655-12-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 2-methoxy-3-ethenylnaphthlane
• 英文别名: 2-Ethenyl-3-methoxynaphthalene
• CAS: 220655-12-9
• 化学式: C₁₃H₁₂O
• 分子量: 184.238
• InChiKey: CNIYSKQMJGKHNP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  14
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.08
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  Grubbs catalyst first generation 、 2-methoxy-3-ethenylnaphthlane 以 二氯甲烷 为溶剂， 以52%的产率得到Cl2Ru(=CH-o-OMeC10H6)(PCy3)
  参考文献：
  名称：

  A Recyclable Ru-Based Metathesis Catalyst

  摘要：

  A Ru carbene (8, Scheme 2) that contains an internal metal-oxygen chelate is an active metathesis catalyst and is readily obtained by the sequential treatment of Cl2Ru(PPh3)(3) with (2-isopropoxyphenyl)-diazomethane and PCy3. This Ru-carbene complex offers excellent stability to air and moisture and can be recycled in high yield by silica gel column chromatography. The structures of this and related complexes have been unambiguously established by NMR and single-crystal X-ray diffraction studies.

  DOI：

  10.1021/ja983222u

文献信息

• Hepatitis C Virus Inhibitors
  申请人：Hiebert Sheldon

  公开号：US20100272674A1

  公开（公告）日：2010-10-28

  Hepatitis C virus inhibitors having the general formula (I) are disclosed. Compositions comprising the compounds and methods for using the compounds to inhibit HCV are also disclosed.

  抑制丙型肝炎病毒的抑制剂具有一般公式（I）。公开了包含这些化合物的组合物和使用这些化合物抑制HCV的方法。
• HEPATITIS C VIRUS INHIBITORS
  申请人：Bristol-Myers Squibb Company

  公开号：EP2331552B1

  公开（公告）日：2013-02-27
• HCV inhibitors
  申请人：Bristol-Myers Squibb Company

  公开号：EP2364321B1

  公开（公告）日：2013-04-17
• RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140178820A1

  公开（公告）日：2014-06-26

  An additive polymer comprising recurring styrene units having an ester group bonded to a CF 3 —C(OR 2 )—R 3 group (wherein R 2 is H, acyl or acid labile group, R 3 is H, CH 3 or CF 3 ) such as 1,1,1,3,3,3-hexafluoro-2-propanol is added to a polymer capable of increasing alkali solubility under the action of acid to formulate a resist composition. The resist composition can minimize outgassing from a resist film during the EUV lithography and form a resist film having a hydrophilic surface sufficient to prevent formation of blob defects on the film after development.
• US9040223B2
  申请人：——

  公开号：US9040223B2

  公开（公告）日：2015-05-26