LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:EP3404700A1
公开(公告)日:2018-11-21
The present invention provides a liquid composition for imparting alcohol-repellency to a semiconductor substrate material, and a method for treating the surface of a semiconductor substrate using the liquid composition, wherein the liquid composition contains: 0.01-15% by mass of a surfactant (A) having a substituent represented by formula (1) (where n is an integer of 3 to 20, inclusive), and an anionic hydrophilic group; and 0.0001-20% by mass of a compound (B) having a weight-average molecular weight of 200-500000 and having 4-30 mmol of an amino group per gram, the compound (B) being selected from the group consisting of compounds having a polyethylenimine and a substituent represented by formula (2) (where R1 and R2 are each independently hydrogen or a C1-6 alkyl, alkenyl, alkynyl, or aryl) or formula (3) (where R3 and R4 are each independently hydrogen or a C1-6 alkyl, alkenyl, alkynyl, or aryl, and X- is a fluoride ion, a chloride ion, a bromide ion, an iodide ion, a fluoroborate ion, a phosphate ion, an acetate ion, a trifluoroacetate ion, a sulfate ion, a hydrogen sulfate ion, a methane sulfate ion, a hydroxide ion, a perchlorate ion, or a nitrate ion).
CnF2n+1- (1)
本发明提供了一种用于赋予半导体衬底材料摈醇性的液体组合物,以及一种使用该液体组合物处理半导体衬底表面的方法,其中该液体组合物包含:0.01-15%(质量)的表面活性剂 (A),该表面活性剂具有由式 (1) 所代表的取代基(其中 n 为 3 至 20(含)的整数)和阴离子亲水基团;以及 0.0001-20% 质量百分比的化合物 (B),其重量-平均分子量为 200-500000,每克含 4-30 mmol 氨基,该化合物 (B) 选自具有聚乙烯亚胺和由式 (2) 代表的取代基(其中 R1 和 R2 各自独立地为氢或 C1-6 烷基、烯基、炔基、或芳基)或式 (3)(其中 R3 和 R4 各自独立地为氢或 C1-6 烷基、烯基、炔基或芳基,X- 为氟离子、氯离子、溴离子、碘离子、氟硼酸根离子、磷酸根离子、乙酸根离子、三氟乙酸根离子、硫酸根离子、硫酸氢根离子、硫酸甲烷根离子、氢氧根离子、高氯根离子或硝酸根离子)。
CnF2n+1- (1)