Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography
申请人:Hohle Christoph
公开号:US20050170283A1
公开(公告)日:2005-08-04
A bottom antireflective coating for photolithography at 157 nm or less, where the bottom antireflective coating includes a crosslinkable polymer which contains cinnamic acid derivatives.
US7405028B2
申请人:——
公开号:US7405028B2
公开(公告)日:2008-07-29
Substituent Effects on the Iodine-Catalyzed Thermal Cyclization of 3,4-Diphenylbuta-1,3-dienyl Isocyanates: Mechanistic Studies
The thermal cyclization of 3,4-diphenylbuta-1,3-dienyl isocyanates 1, generated in situ from the corresponding azides, was investigated using iodine as a catalyst. Diphenylpyridinones 2, phenylnaphthalenes 3, and indenes 4 were produced viaintramolecularringclosure. The nature of the substituents on the phenyl rings was found to be crucial to the distribution of cyclized products 2–4. The mechanism