2,8,14,20-Tetrakis(5-bromo-2,4-dimethylphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol | 1021604-66-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: 2,8,14,20-Tetrakis(5-bromo-2,4-dimethylphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol
• CAS: 1021604-66-9
• 化学式: C₆₀H₅₂Br₄O₈
• 分子量: 1220.68
• InChiKey: SIAFOSXUCKLBNJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  16.3
• 重原子数：
  72
• 可旋转键数：
  4
• 环数：
  9.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  162
• 氢给体数：
  8
• 氢受体数：
  8

文献信息

• RADIATION-SENSITIVE COMPOSITION
  申请人：Echigo Masatoshi

  公开号：US20100047709A1

  公开（公告）日：2010-02-25

  A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Still further described are a radiation-sensitive composition containing a solvent and a cyclic compound having a specific structure, for example, a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups (aldehyde compound (A1)) with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups (phenol compound (A2)), and a cyclic compound for use in the radiation-sensitive composition.
• US8110334B2
  申请人：——

  公开号：US8110334B2

  公开（公告）日：2012-02-07
• US8846292B2
  申请人：——

  公开号：US8846292B2

  公开（公告）日：2014-09-30
• US9897913B2
  申请人：——

  公开号：US9897913B2

  公开（公告）日：2018-02-20