1,3-Dimethyl-admantane-5,7-dinitrile | 41973-91-5

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: 1,3-Dimethyl-admantane-5,7-dinitrile
• 英文别名: 5,7-Dimethyladamantane-1,3-dicarbonitrile
• CAS: 41973-91-5
• 化学式: C₁₄H₁₈N₂
• 分子量: 214.31
• InChiKey: YUEZXSQNSJWXSD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  16
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  47.6
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1602975A1

  公开（公告）日：2005-12-07

  A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing-resin is smaller than 1.5.

  一种辐射敏感树脂组合物，包括一种通过活自由基聚合获得的具有特定结构的含酸基团树脂，该树脂不溶于碱或几乎不溶于碱，但在酸的作用下可溶于碱，还包括一种光酸发生器，其中含酸基团树脂的重量平均分子量与数量平均分子量之比（重量平均分子量/数量平均分子量）小于 1.5。
• FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP2003148A2

  公开（公告）日：2008-12-17

  An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

  本发明的目的是提供一种新型含氟聚合物、一种用于液浸光刻的辐射敏感树脂组合物，该组合物含有该含氟聚合物，可使图案具有极佳的形状和极佳的焦深、其中，在液浸光刻过程中，液浸光刻用液体（如水）中与光刻胶接触的被洗脱成分的量很少，而且光刻胶膜与液浸光刻用液体（如水）之间的后退接触角较大；以及一种纯化含氟聚合物的方法。本树脂组合物包括含有通式（1）和（2）表示的重复单元且 Mw 为 1,000-50,000 的新型含氟聚合物（A）、具有酸不稳定基团的树脂（B）、辐射敏感酸发生器（C）、含氮化合物（D）和溶剂（E）。
• Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
  申请人：JSR CORPORATION

  公开号：US10082733B2

  公开（公告）日：2018-09-25

  An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

  本发明的目的是提供一种新型含氟聚合物、一种用于液浸光刻的辐射敏感树脂组合物，该组合物含有该含氟聚合物，可使图案具有极佳的形状和极佳的焦深、其中，在液浸光刻过程中，液浸光刻用液体（如水）中与光刻胶接触的被洗脱成分的量很少，而且光刻胶膜与液浸光刻用液体（如水）之间的后退接触角较大；以及一种纯化含氟聚合物的方法。本树脂组合物包括含有通式（1）和（2）表示的重复单元且 Mw 为 1,000-50,000 的新型含氟聚合物（A）、具有酸不稳定基团的树脂（B）、辐射敏感酸发生器（C）、含氮化合物（D）和溶剂（E）。
• RADIATION-SENSITIVE RESIN COMPOSITION COMPRISING A FLUORINE-CONTAINING POLYMER
  申请人：JSR Corporation

  公开号：EP2003148B1

  公开（公告）日：2017-07-19