Salt suitable for an acid generator and a chemically amplified resist composition containing the same
申请人:Sumitomo Chemical Company, Limited
公开号:US07527910B2
公开(公告)日:2009-05-05
The present invention provides a salt of the formula (I):
wherein X represents alkylene group or substituted alkylene group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows 0 or 1.
The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I), and a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
本发明提供了一种公式(I)的盐:
其中X代表亚烷基或取代亚烷基;Q1和Q2各自独立代表氟原子或具有1至6个碳原子的全氟烷基;A+代表有机反离子;n表示0或1。
本发明还提供了一种化学放大的光刻胶组合物,该组合物包含公式(I)的盐,以及一种含有酸不稳定的结构单元的树脂,该树脂本身在碱性水溶液中不溶或微溶,但在酸的作用下变得可溶于碱性水溶液中。