Poly (Imide-Azomethine ) Copolymer, Poly (Amic Acid-Azomethine) Copolymer , and Positive Photosensitive Resin Composition
申请人:Hasegawa Masatoshi
公开号:US20070254245A1
公开(公告)日:2007-11-01
A poly(imide-azomethine)copolymer that has a low linear thermal expansion coefficient and a method for producing the same copolymer are provided. Also provided are a poly(amic acid-azomethine)copolymer that is a precursor polymer of the poly(imide-azomethine)copolymer; a positive photosensitive resin composition composed of the precursor polymer and a photosensitizer; and a method for making a fine pattern of poly(imide-azomethine)copolymer from the resin composition.
The poly(imide-azomethine)copolymer is composed of azomethine polymer units of the following formula (1) and imide polymer units of the following general formula (2), and the poly(amic acid-azomethine)copolymer, the major component of the positive photosensitive resin composition, is composed of azomethine polymer units of the following formula (1) and amic acid polymer units of the following formula (3). In the formulas (1) to (3), A and D are each independently a divalent aromatic or aliphatic group, and B is a tetravalent aromatic or aliphatic group;
wherein in the formulas (1) and (2), A and D are each independently a divalent aromatic or aliphatic group, and B is a tetravalent aromatic or aliphatic group.