Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component.
提供了一种包括至少一个
乙酸基取代的环状芳基或杂环芳基的酸发生剂。这些酸发生剂在光刻胶组分中特别有用。