This invention relates to the preparation of solvent soluble polymeric materials which become insoluble in solvents after exposure to actinic light, x-rays or electron beams.
The polymers are linear block copolymers comprising two segments; a soft segment which form a continuous phase, and a rigid, crystallizable photoreactive segment which forms a dispersed phase. The rigid segments may be chosen from polyurethanes, polyesters, polyamides, and polyureas which contain a diacetylene group in their repeat units. The soft segments are low molecular weight rubbery polymers which may be selected from groups such as polyethers, polyesters, polydienes, and polysiloxanes.
The polymers produced are useful in a wide variety of applications in the field of coatings and graphic arts. More particularly, this invention relates to negative photoresists which are remarkable by their (1) high photosensitivity (2) great latitude in tailoring of film properties, (3) high thermal stability and (4) oxygen insensitivity.
本发明涉及溶剂可溶聚合材料的制备,这种材料在受到放 射光、X 射线或电子束照射后会变得不溶于溶剂。
这种聚合物是线性嵌段共聚物,由两部分组成:形成连续相的软段和形成分散相的刚性可结晶光活性段。刚性段可选自聚
氨酯、聚酯、聚酰胺和聚
脲,它们的重复单元中含有二
乙炔基团。软段是低分子量的橡胶聚合物,可选自聚醚、聚酯、聚二烯和聚
硅氧烷等组。
生产出的聚合物可广泛应用于涂料和制图领域。更具体地说,本发明涉及负片光刻胶,其显著特点是:(1) 高光敏性;(2) 在定制薄膜特性方面有很大的自由度;(3) 高热稳定性;(4) 对氧不敏感。