4-甲氧苯基-4-O-乙酰基-3,6-二-O-苄基-2-脱氧-2-苯二甲酰亚氨基-β-D-吡喃葡萄糖苷 | 140615-77-6

• 物质功能分类: 医药中间体 - 吡喃类化合物
• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 4-甲氧苯基-4-O-乙酰基-3,6-二-O-苄基-2-脱氧-2-苯二甲酰亚氨基-β-D-吡喃葡萄糖苷
• 中文别名: 4-甲氧苯基4-O-乙酰基-3,6-二-O-苄基-2-脱氧-2-苯二甲酰亚氨基-Β-D-吡喃葡萄糖苷
• 英文名称: 4-methoxyphenyl 4-O-acetyl-3,6-di-O-benzyl-2-deoxy-2-phthalimido-β-D-glucopyranoside
• 英文别名: 4-Methoxyphenyl 4-O-Acetyl-3,6-di-O-benzyl-2-deoxy-2-phthalimido-beta-D-glucopyranoside；[(2R,3S,4R,5R,6S)-5-(1,3-dioxoisoindol-2-yl)-6-(4-methoxyphenoxy)-4-phenylmethoxy-2-(phenylmethoxymethyl)oxan-3-yl] acetate
• CAS: 140615-77-6
• 化学式: C₃₇H₃₅NO₉
• 分子量: 637.686
• InChiKey: QZTMIUALKXAHCQ-LEWWELECSA-N

物化性质

• 溶解度：
  溶于氯仿

计算性质

• 辛醇/水分配系数(LogP)：
  5.2
• 重原子数：
  47
• 可旋转键数：
  13
• 环数：
  6.0
• sp3杂化的碳原子比例：
  0.27
• 拓扑面积：
  110
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为反应物：
  描述：

  4-甲氧苯基-4-O-乙酰基-3,6-二-O-苄基-2-脱氧-2-苯二甲酰亚氨基-β-D-吡喃葡萄糖苷 在 magnesium methanolate 作用下， 以 四氢呋喃 、 甲醇 为溶剂， 反应 2.5h， 以2.24 g的产率得到4-甲氧苯基-3,6-二-O-苄基-2-脱氧-2-苯二甲酰亚氨基-β-D-吡喃葡萄糖苷
  参考文献：
  名称：

  Use of methanesulfonic acid in the reductive ring-opening of O-benzylidene acetals

  摘要：

  Methanesulfonic acid was shown to be an efficient and convenient substitute for ethereal HCl in reductive 4,6-O-benzylidene acetal ring-opening reaction with sodium cyanoborohydride in THF. Normal regioselectivity was observed, the 6-O-benzyl ethers with free 4-OH group being the major products of the reaction. (c) 2006 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.carres.2006.10.009
• 作为产物：
  描述：

  4-甲氧苯基-3,6-二-O-苄基-2-脱氧-2-苯二甲酰亚氨基-β-D-吡喃葡萄糖苷 生成 4-甲氧苯基-4-O-乙酰基-3,6-二-O-苄基-2-脱氧-2-苯二甲酰亚氨基-β-D-吡喃葡萄糖苷
  参考文献：
  名称：

  NAKANO, TAKAHISA;ITO, YUKISHIGE;OGAWA, TOMOYA, TETRAHEDRON LETT., 31,(1990) N1, C. 1597-1600

  摘要：

  DOI：

文献信息

• Polishing composition and polishing method using the same
  申请人：Mizuno Takahiro

  公开号：US10144849B2

  公开（公告）日：2018-12-04

  A polishing composition contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R1—N(—R2)—R3 in which R1, R2, and R3 each represent an alkyl group with or without a characteristic group, two of R1 to R3 may form a part of a heterocycle, and two of R1 to R3 may be identical and form a part of a heterocycle with the remaining one. Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition may contain a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.

  一种抛光组合物含有一种含氮化合物和磨粒，组合物的 pH 值在 1 至 7 之间。抛光组合物中的含氮化合物最好具有由式表示的结构：R1-N(-R2)-R3，其中 R1、R2 和 R3 各代表一个带或不带特征基团的烷基，R1 至 R3 中的两个可构成杂环的一部分，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分。另外，含氮化合物最好选自羧基甜菜碱型两性表面活性剂、磺基甜菜碱型两性表面活性剂、咪唑啉型两性表面活性剂和氧化胺型两性表面活性剂组成的组。抛光组合物可包含水溶性聚合物和磨粒，组合物的 pH 值范围为 1 至 8。
• Polishing Composition and Polishing Method Using the Same
  申请人：Mizuno Takahiro

  公开号：US20100301014A1

  公开（公告）日：2010-12-02

  A polishing composition contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R 1 —N(—R 2 )—R 3 in which R 1 , R 2 , and R 3 each represent an alkyl group with or without a characteristic group, two of R 1 to R 3 may form a part of a heterocycle, and two of R 1 to R 3 may be identical and form a part of a heterocycle with the remaining one. Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition may contain a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.