Resist composition, method of forming resist pattern, novel compound and acid generator
申请人:Kawaue Akiya
公开号:US20100196820A1
公开(公告)日:2010-08-05
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R
5
represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Q
5
represents a single bond or a divalent linking group).
一种抗蚀组合物,包括在酸处理下在碱性显影溶液中表现出溶解性变化的基础组分(A)和在暴露后生成酸的酸生成组分(B),酸生成组分(B)包括含有由通式(I)表示的阳离子基团的酸生成剂(B1)(在该式中,R5代表氢原子或具有1至30个碳原子的有可能具有取代基的有机基团;Q5代表单键或二价连接基团)。