6-(Dicyclohexylamino)-1,3,5-triazine-2,4(1H,3H)-dithione | 51105-02-3

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: 6-(Dicyclohexylamino)-1,3,5-triazine-2,4(1H,3H)-dithione
• 英文别名: 6-(dicyclohexylamino)-1H-1,3,5-triazine-2,4-dithione
• CAS: 51105-02-3
• 化学式: C₁₅H₂₄N₄S₂
• 分子量: 324.5
• InChiKey: QEQSXQYJJLHQHU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  21
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  104
• 氢给体数：
  2
• 氢受体数：
  2

文献信息

• ANTIREFLECTIVE FILM CONTAINING SULFUR ATOM
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP1757985A1

  公开（公告）日：2007-02-28

  There is provided an anti-reflective coating forming composition comprising a solid content and a solvent, wherein a proportion of sulfur atom in the solid content is 5 to 25 mass%. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as F2 excimer laser beam (wavelength 157 nm) or ArF excimer laser beam (wavelength 193 nm), etc.

  本发明提供了一种抗反射涂层形成组合物，该组合物由固体成分和溶剂组成，其中固体成分中硫原子的比例为 5 至 25 质量％。由该组合物制得的防反射涂层对反射光有很好的防止效果，不会与光刻胶混合，并且可以在光刻工艺中使用短波长的光，如 F2 准分子激光束（波长 157 nm）或 ArF 准分子激光束（波长 193 nm）等。
• Thiol compound derivative, hardening compositions containing these derivatives and molded articles thereof
  申请人：——

  公开号：US20040162368A1

  公开（公告）日：2004-08-19

  The present invention relates to a thiol compound derivative represented by the following formula (1), a curable composition containing the derivative, and a molded product made of the composition. More particularly, the invention relates to a thiol compound derivative which is added to a polymer having reactivity to a thiol derivative substituent to provide a curable composition, a curable composition containing the derivative and a crosslinkable halogen-containing crosslinking polymer, and a crosslinked molded product of the composition. 1 wherein X 1 , X 2 and X 3 are each a group represented by the following formula (2). 2

  本发明涉及由下式（1）表示的硫醇化合物衍生物、含有该衍生物的可固化组合物以及由该组合物制成的模塑产品。更具体地说，本发明涉及一种硫醇化合物衍生物，将其添加到对硫醇衍生物取代基具有反应活性的聚合物中，以提供一种可固化组合物、一种含有该衍生物和一种可交联含卤交联聚合物的可固化组合物，以及一种由该组合物制成的交联模塑产品。 1 其中 X 1 , X 2 和 X 3 分别是下式（2）所代表的一个基团。 2
• THIOL COMPOUND DERIVATIVES, HARDENING COMPOSITIONS CONTAINING THESE DERIVATIVES AND MOLDED ARTICLES THEREOF
  申请人：Unimatec Co., Ltd.

  公开号：EP1394153B1

  公开（公告）日：2010-12-29
• Thiol compound derivative, curable composition containing the derivative, and molded product thereof
  申请人：Endo Kiyoshi

  公开号：US20070155868A1

  公开（公告）日：2007-07-05

  The present invention relates to a thiol compound derivative represented by the following formula (1), a curable composition containing the derivative, and a molded product made of the composition. More particularly, the invention relates to a thiol compound derivative which is added to a polymer having reactivity to a thiol derivative substituent to provide a curable composition, a curable composition containing the derivative and a crosslinkable halogen-containing crosslinking polymer, and a crosslinked molded product of the composition. wherein X 1 , X 2 and X 3 are each a group represented by the following formula (2).
• Anti-Reflective Coating Containing Sulfur Atom
  申请人：Hiroi Yoshiomi

  公开号：US20080107997A1

  公开（公告）日：2008-05-08

  There is provided an anti-reflective coating forming composition comprising a solid content and a solvent, wherein a proportion of sulfur atom in the solid content is 5 to 25 mass %. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as F2 excimer laser beam (wavelength 157 nm) or ArF excimer laser beam (wavelength 193 nm), etc.