申请人:JAPAN SYNTHETIC RUBBER CO., LTD.
公开号:EP0365318A2
公开(公告)日:1990-04-25
A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alkali-soluble novolak resin comprises a mixture of:
95-50 parts by weight of Resin A having a standard polystyrene-reduced weight-average molecular weight of 4,000-20,000 [Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I′):
wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol repreented by the above structural formula (I) or (I′) with at least one aldehyde] and
5-50 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 [Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II):
wherein n is 0, 1, 2 or 3, with at least one aldehyde].
In the resin composition, the mixture of Resin A and Resin B may further contain Resin C which is an ester of Resin B with a 1,2-quinonediazidesulfonic acid. The radiation-sensitive resin compopsition is suitable for use as a positive type resist having high sensitivity, excellent developability, high resolution and excellent heat resistance.
一种辐射敏感树脂组合物,包括碱溶性酚醛树脂和 1,2-醌噻嗪化合物,其中碱溶性酚醛树脂包括以下物质的混合物:
95-50 重量份的树脂 A,其标准聚苯乙烯还原平均分子量为 4,000-20,000 [树脂 A 是至少一种树脂,选自由间甲酚和至少一种由结构式(I)或(I′)代表的苯酚缩聚而成的树脂:
其中 m 为 2 或 3,与至少一种醛缩聚而得的树脂,以及间甲酚、对甲酚和由上述结构式 (I) 或 (I′) 表示的至少一种苯酚与至少一种醛缩聚而得的树脂]和
5-50 份(重量)标准聚苯乙烯还原平均分子量为 200-2,000 的树脂 B [树脂 B 是由至少一种结构式(II)所代表的苯酚缩聚而成的树脂:
其中 n 为 0、1、2 或 3,与至少一种醛缩聚而成的树脂]。
在树脂组合物中,树脂 A 和树脂 B 的混合物可进一步包含树脂 C,它是树脂 B 与 1,2-醌二磺酸的酯。辐射敏感树脂组合物适合用作正型抗蚀剂,具有高灵敏度、优异的显影性、高分辨率和优异的耐热性。