1,1,2,3,3-pentachloro-1,2,3-trifluoropropane | 1652-74-0

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: 1,1,2,3,3-pentachloro-1,2,3-trifluoropropane
• 英文别名: 1,1,2,3,3-pentachloro-1,2,3-trifluoro-propane；pentachloro-1,2,3-trifluoro-propane；Pentachlor-1,2,3-trifluor-propan；1,1,2,3,3-Pentachlor-trifluor-propan；1.2.3-Trifluor-pentachlor-propan
• CAS: 1652-74-0
• 化学式: C₃Cl₅F₃
• 分子量: 270.293
• InChiKey: DIVFMHLKEVWYPD-UHFFFAOYSA-N

物化性质

• 熔点：
  -58 °C
• 沸点：
  112.5-112.6 °C
• 密度：
  1.7185 g/cm3

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  1,1,1,2,3,3-hexachloro-2,3-difluoro-propane 在 氯化锑(V) 三氟化锑 作用下， 生成 1,1,2,3,3-pentachloro-1,2,3-trifluoropropane
  参考文献：
  名称：

  Paleta,O. et al., Collection of Czechoslovak Chemical Communications, 1967, vol. 32, p. 3888 - 3896

  摘要：

  DOI：

文献信息

• Synthese de materiaux polymeres transparents. Partie I Synthese du trifluoroacrylate de trideuteromethyle
  作者：B. Boutevin、Y. Pietrasanta、A. Rousseau、D. Bosc

  DOI：10.1016/s0022-1139(00)82012-6

  日期：1987.11

  The acrylic ester F2CCFCO2CD3 is prepared from a mixture of difluorotetrachloroethanes CFCI2CFCI2 and CF2CICCI. The dehalogenation of these Freons, followed by the addition of CFCI3 by means of AICI3 leads to a mixture of chlorofluoropropanes. The hydrolysis with oleum gives the acid chlorides which are then esterified by CD3OD. The dehalogenation of the mixture by the zinc stirred in oxalic acid

  丙烯酸酯F 2 C ＝ CF ＝ CO 2 CD 3由二氟四氯乙烷CFCI 2 ＝ CFCl 2和CF 2 CI ＝ CCI的混合物制备。这些氟利昂的脱卤，接着加入CFCI的3通过AICI的手段3所导致氯氟丙烷的混合物。用发烟硫酸水解得到酰氯，然后将其用CD 3 OD酯化。通过在草酸中搅拌的锌使混合物脱卤，能够通过蒸馏分离预期的酯。该化合物的折射率为n 20 D= 1.3667在0.6和1.4μm之间的近红外光中没有显示出主要吸收。因此，相应的聚合物可能为光纤的芯提供良好的材料。
• Adsorbent for purifying perfluorocarbon, process for producing same, high purity octafluoropropane and octafluorocyclobutane, and use thereof
  申请人：——

  公开号：US20030181315A1

  公开（公告）日：2003-09-25

  To provide a purification adsorbent capable of effectively removing impurities contained in a perfluorocarbon and obtaining a perfluorocarbon reduced in the impurity content to 1 ppm by mass or less; a process for producing the adsorbent; high-purity octafluoropropane or octafluorocyclobutane; processes for purifying and for producing the octafluoropropane or octafluorocyclobutane; and uses thereof. Purification is performed using a purification adsorbent produced by a method comprising (1) washing an original coal with an acid and then with water, (2) deoxidizing and/or dehydrating the original coal, (3) re-carbonizing the original coal at a temperature of from 500 to 700° C. and (4) activating the original coal at a temperature of from 700 to 900° C. in a mixed gas stream containing an inert gas, carbon dioxide and water vapor.

  提供一种净化吸附剂，该吸附剂能够有效去除全氟碳中含有的杂质，并获得杂质含量降低到 1 ppm（质量分数）或更低的全氟碳；一种生产该吸附剂的工艺；高纯度八氟丙烷或八氟环丁烷；净化和生产八氟丙烷或八氟环丁烷的工艺；及其用途。净化是使用净化吸附剂进行的，净化吸附剂的生产方法包括：(1)用酸洗原煤，然后用水洗净；(2)原煤脱氧和/或脱水；(3)原煤在 500 至 700 摄氏度的温度下重新碳化；(4)原煤在 700 至 900 摄氏度的温度下在含有惰性气体、二氧化碳和水蒸气的混合气体流中活化。
• Process for purifying octafluoropropane, process for preparing the same, and use thereof
  申请人：——

  公开号：US20040047785A1

  公开（公告）日：2004-03-11

  A process for purifying octafluoropropane according to the present invention comprises the step of contacting a crude octafluoropropane containing impurities with an impurity decomposing agent under elevated temperature and then with an adsorbent to substantially remove the impurities from the crude octafluoropropane. According to the purification process or preparation process of octafluoropropane of the present invention, the impurities such as chlorine compounds can be substantially removed and a high-purity octafluoropropane can be easily obtained. The octafluoropropane obtained by the purification process of the present invention is substantially free of impurities and therefore, can be used as an etching or cleaning gas for use in the production process of a semiconductor device and the like.

  根据本发明的八氟丙烷提纯工艺包括以下步骤：将含有杂质的粗八氟丙烷与杂质分解剂在高温下接触，然后与吸附剂接触，以从粗八氟丙烷中基本去除杂质。 根据本发明的八氟丙烷提纯工艺或制备工艺，可以将氯化合物等杂质基本去除，轻松获得高纯度的八氟丙烷。通过本发明的提纯工艺获得的八氟丙烷基本上不含杂质，因此可用作半导体设备等生产过程中的蚀刻或清洗气体。
• Paleta, Oldrich; Kvicala, Jaroslav; Guenter, Jaroslav, Bulletin de la Societe Chimique de France, 1986, # 6, p. 920 - 924
  作者：Paleta, Oldrich、Kvicala, Jaroslav、Guenter, Jaroslav、Dedek, Vaclav

  DOI：——

  日期：——
• PALETA O.; POSTA A.; LISKA F., SB. VSCHT. PRAZE, 1978, C25, 105-121
  作者：PALETA O.、 POSTA A.、 LISKA F.

  DOI：——

  日期：——