申请人:Ohmeda Pharmaceutical Products Division Inc.
公开号:EP0315405A1
公开(公告)日:1989-05-10
Compounds of the formula:
and/or pharmaceutically acceptable acid addition salts thereof, in which formula: R¹ is phenyl; R² is phenyl unsubstituted or substituted with one or more halogens; R³ is a lower alkyl, a lower cycloalkyl or a lower alkoxy lower alkyl group; and L is a lower alkenyl group or a substituted lower alkyl group which is thienyl lower alkyl; thiazolyl lower alkyl; [4-(lower alkyl) thiazolyl] lower alkyl; (4,5-dihydro-5-oxo-1H-tetrazol-y-1-yl) lower alkyl; [4-(lower alkyl) 4,5-dihydro-5-oxo-1H-tetrazol-1-yl] lower alkyl; 1H-pyrazolyl lower alkyl; 2-(2-dihydro-2-oxo-3H-benzoxazol-3-yl) lower alkyl; pyridyl lower alkyl; [(2-lower alkyl)5-nitro-1H-imidazol-1-yl] lower alkyl; [4-(halo) 1H-pyrazolyl] lower alkyl substituted in the 4 position by a halogen; lower cycloalkyl lower alkyl or phenyl lower alkyl have analgesic properties.
式化合物
和/或其药学上可接受的酸加成盐,其中式中R¹为苯基;R²为未取代的苯基或被一个或多个卤素取代的苯基;R³为低级烷基、低级环烷基或低级烷氧基低级烷基;L为低级烯基或取代的低级烷基,其为噻吩基低级烷基;噻唑基低级烷基;[4-(低级烷基)噻唑基]低级烷基;(4,5-二氢-5-氧代-1H-四唑-1-基)低级烷基;[4-(低级烷基) 4,5-二氢-5-氧代-1H-四唑-1-基]低级烷基;1H-吡唑低级烷基;2-(2-二氢-2-氧代-3H-苯并恶唑-3-基)低级烷基;吡啶低级烷基;(2-低级烷基)5-硝基-1H-咪唑-1-基]低级烷基;在 4 位被卤素取代的[4-(卤代)1H-吡唑基]低级烷基;低级环烷基低级烷基或苯基低级烷基具有镇痛特性。