作者:Jonathan D. Rich
DOI:10.1021/ja00197a058
日期:1989.7
procedure is tolerant of a variety of aromatic substituents, for example, alkyl, halo, nitro, cyano, imide, acid anhydride, etc., and the synthesis of several new substituted aromatic chlorosilanes containing benzoyl chloride and phthalic anhydride moieties is described. Chloromethyldisilane starting reagents are available from the direct reaction of methyl chloride and silicon, making this methodology
描述了一种通过钯催化的甲基氯乙硅烷和芳族酰氯反应制备芳族氯硅烷的新合成方法。甲硅烷基化脱羰过程是无溶剂的,可以利用低金属催化剂负载量(500-1,000 ppm Pd),在温和条件(145°C)下进行,并且选择性地以良好的产率(通常为 60-85%)得到芳族氯硅烷。该程序可以容忍多种芳族取代基,例如烷基、卤素、硝基、氰基、酰亚胺、酸酐等,并且描述了几种新的含有苯甲酰氯和邻苯二甲酸酐部分的取代芳族氯硅烷的合成。氯甲基乙硅烷起始试剂可得自氯甲烷与硅的直接反应,