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1,1-bis(4-hydroxyphenyl)acenaphthene | 848873-62-1

中文名称
——
中文别名
——
英文名称
1,1-bis(4-hydroxyphenyl)acenaphthene
英文别名
4-[1-(4-hydroxyphenyl)-2H-acenaphthylen-1-yl]phenol
1,1-bis(4-hydroxyphenyl)acenaphthene化学式
CAS
848873-62-1
化学式
C24H18O2
mdl
——
分子量
338.406
InChiKey
RYJDBDLZSUBCIP-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    517.3±50.0 °C(Predicted)
  • 密度:
    1.308±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    5.9
  • 重原子数:
    26
  • 可旋转键数:
    2
  • 环数:
    5.0
  • sp3杂化的碳原子比例:
    0.08
  • 拓扑面积:
    40.5
  • 氢给体数:
    2
  • 氢受体数:
    2

反应信息

点击查看最新优质反应信息

文献信息

  • Method of manufacturing a semiconductor device
    申请人:Oguro Dai
    公开号:US20070059632A1
    公开(公告)日:2007-03-15
    The compound of the present invention is represented by the following formula 1: wherein R 1 , R 2 , R 4 , R 5 , m0 to m2, and n0 to n2 are as defined in the description. Radiation sensitive compositions containing the compound of the formula 1 as a main component of the solid component are excellent in sensitivity, resolution, heat resistance, etching resistance, and solubility in solvent.
    本发明的化合物由以下的公式1表示:其中,R1、R2、R4、R5、m0至m2和n0至n2的定义如描述中所述。含有公式1化合物作为固体组分主要成分的辐射敏感组合物在敏感性、分辨率、耐热性、耐蚀性和溶解度方面表现出色。
  • POLYCARBONATE RESIN AND METHOD FOR PRODUCING THE SAME
    申请人:Yoshida Shu
    公开号:US20100121018A1
    公开(公告)日:2010-05-13
    The present invention can provide a polycarbonate resin containing a structural unit represented by the following formula (1). In the formula (1), R represents one selected from an alkyl group having 1 to 9 carbon atoms, an aryl group having 6 to 12 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, an aralkyl group having 7 to 17 carbon atoms, and halogen; and n represents the number of substituting R's on a benzene ring and is an integer of 0 to 4. Y represents an alkylene group having 1 to 4 carbon atoms; and p is an integer of 0 to 4.
    本发明提供了一种含有由下式(1)表示的结构单元的聚碳酸酯树脂。 在式(1)中,R代表选择自具有1至9个碳原子的烷基基团、具有6至12个碳原子的芳基基团、具有2至5个碳原子的烯基基团、具有1至5个碳原子的烷氧基团、具有7至17个碳原子的芳烃基团以及卤素的其中之一;n代表取代苯环上的R的数量,是一个0至4的整数。Y代表具有1至4个碳原子的烷基链;p是一个0至4的整数。
  • COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION
    申请人:MITSUBISHI GAS CHEMICAL COMPANY, INC.
    公开号:EP1666970A1
    公开(公告)日:2006-06-07
    The compound of the present invention is represented by the following formula 1: wherein R1, R2, R4, R5, m0 to m2, and n0 to n2 are as defined in the description. Radiation sensitive compositions containing the compound of the formula 1 as a main component of the solid component are excellent in sensitivity, resolution, heat resistance, etching resistance, and solubility in solvent.
    本发明的化合物由下式 1 表示: 其中 R1、R2、R4、R5、m0 至 m2 和 n0 至 n2 如说明中所定义。含有式 1 所示化合物作为固体组分主要成分的辐射敏感性组合物在敏感性、分辨率、耐热性、抗蚀刻性和溶剂溶解性方面都非常出色。
  • EP2149587B1
    申请人:——
    公开号:EP2149587B1
    公开(公告)日:2011-06-29
  • Resist composition
    申请人:Echigo Masatoshi
    公开号:US20080153031A1
    公开(公告)日:2008-06-26
    A radiation-sensitive composition containing a resist compound A, an acid generator B, and an acid crosslinking agent C. The resist compound A is (a) a polyphenol compound which is produced by the condensation of a C 5-45 aromatic ketone or aromatic aldehyde with a C 6-15 compound having from 1 to 3 phenolic hydroxyl groups, and, (b) its molecular weight is form 300 to 5000. The radiation-sensitive composition is solvent-soluble and exhibits a high sensitivity, high resolution, and high heat resistance.
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