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3-ethyl-3-(3-hydroxypropyl)oxymethyloxetane | 959851-08-2

中文名称
——
中文别名
——
英文名称
3-ethyl-3-(3-hydroxypropyl)oxymethyloxetane
英文别名
3-Ethyl-3-(3-hydroxypropyl)oxymethyl-oxetane;3-[(3-ethyloxetan-3-yl)methoxy]propan-1-ol
3-ethyl-3-(3-hydroxypropyl)oxymethyloxetane化学式
CAS
959851-08-2
化学式
C9H18O3
mdl
——
分子量
174.24
InChiKey
DKBJETRCOHGWRJ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.4
  • 重原子数:
    12
  • 可旋转键数:
    6
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    38.7
  • 氢给体数:
    1
  • 氢受体数:
    3

反应信息

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文献信息

  • Resin composition for stereolithography
    申请人:CMET Inc.
    公开号:US08293448B2
    公开(公告)日:2012-10-23
    Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below: wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond, in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.
    提供的是一种用于立体光刻的树脂组合物,其在未固化状态下吸收的水和湿气很少,即使在高湿度下也能保持低吸湿率,并具有高固化敏感性,从而可以顺利地生产出具有尺寸精度、机械性能和尺寸稳定性等优良性能的立体光刻产品,以减少光照时间。该立体光刻用树脂组合物包括以下一般式(I)表示的环氧乙烷化合物:其中R1表示具有1到5个碳原子的烷基,R2表示具有2到10个碳原子的烷基,可能含有醚键,在立体光刻用树脂组合物的总质量基础上,按3至60质量%的比例。
  • 3-ETHYLOXETHANE COMPOUND HAVING HYDROXYL GROUP AND METHOD FOR PRODUCING THE SAME
    申请人:Hirotsu Kenji
    公开号:US20100174098A1
    公开(公告)日:2010-07-08
    Disclosed is a 3-ethyloxethane compound having a hydroxyl group which is represented by the following general formula (1). (1) (In the formula, A represents an alkylene group having 3-5 carbon atoms which may have an ether bond or an alkylene group having 3-5 carbon atoms which may be substituted by a hydroxyl group.) The 3-ethyloxethane compound having a hydroxyl group can be produced by reacting a 3-ethyloxethane compound represented by the general formula (2) below, a diol compound represented by the general formula (3) below and a base. (2) (In the formula, X represents a leaving group.) (3) (In the formula, A is as defined above.)
    本发明涉及一种具有羟基的3-乙氧基乙烷化合物,其由以下通式(1)表示。(1)(在该式中,A表示具有3-5个碳原子的可具有醚键或可被羟基取代的烷基基团。)具有羟基的3-乙氧基乙烷化合物可以通过将以下通式(2)所表示的3-乙氧基乙烷化合物、以下通式(3)所表示的二元醇化合物以及碱反应而制得。(2)(在该式中,X表示离去基团。)(3)(在该式中,A如上所定义。)
  • RESIN COMPOSITION FOR STEREOLITHOGRAPHY
    申请人:Ito Takashi
    公开号:US20090209674A1
    公开(公告)日:2009-08-20
    Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below; (wherein R 1 denotes an alkyl group having 1 to 5 carbon atoms, and R 2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond) in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.
    提供了一种用于立体光刻的树脂组合物,其在未固化状态下吸收的水分和湿气很少,即使在高湿度下也保持低的吸湿率,并具有高的固化敏感性,可以顺利生产出具有尺寸精度、机械性能和尺寸稳定性等优良性能的立体光刻产品,从而减少光照时间。该立体光刻用树脂组合物包括以下通式(I)所表示的环氧乙烷化合物;(其中R1表示1至5个碳原子的烷基,R2表示含有2至10个碳原子的烷基,可能含有醚键),其比例为3至60质量%,基于立体光刻用树脂组合物的总质量。
  • THERMALLY POLYMERIZABLE RESIN COMPOSITION
    申请人:Nippon Steel Chemical Co., Ltd.
    公开号:EP2065426A1
    公开(公告)日:2009-06-03
    Disclosed is a water-soluble, thermally polymerizable oxetane composition essentially comprising a water-soluble oxetane compound and a heteropolyacid. The water-soluble thermally polymerizable oxetane resin composition essentially comprises (A) a water-soluble oxetane compound and (B) at least one heteropolyacid compound selected from heteropolyacids and heteropolyacid salts. The water-soluble oxetane compound may contain one or more oxetane functional groups in the molecule and one or more alcoholic OH groups in the molecule. The heteropolyacids include phosphotungstic acid, phosphomolybdic acid, silicotungstic acid, and silicomolybdic acid and mixtures thereof. The heteropolyacid salts include phosphotungstic acid salts, phosphomolybdic acid salts, silicotungstic acid salts, and silicomolybdic acid salts and mixtures thereof.
    本发明公开了一种水溶性热可聚合氧杂环丁烷组合物,该组合物基本上由水溶性氧杂环丁烷化合物和杂多酸组成。水溶性热聚合氧杂环丁烷树脂组合物主要包括(A)水溶性氧杂环丁烷化合物和(B)至少一种选自杂多酸和杂多酸盐类的杂多酸化合物。水溶性氧杂环丁烷化合物分子中可能含有一个或多个氧杂环丁烷官能团,分子中可能含有一个或多个醇羟基。杂多酸包括磷钨酸、磷钼酸、硅钨酸和硅钼酸及其混合物。杂多酸盐类包括磷钨酸盐、磷钼酸盐、硅钨酸盐和硅钼酸盐及其混合物。
  • Low-viscosity liquid radiation curable dental aligner mold resin compositions for additive manufacturing
    申请人:DSM IP Assets B.V.
    公开号:EP2842980A1
    公开(公告)日:2015-03-04
    Liquid radiation curable resin compositions for additive manufacturing comprising: from about 5 to about 30 wt.% of an oxetane; a (meth)acrylate component; a cationic photoinitiator; a free-radical photoinitiator; and from about 50 to about 80 wt.% of an epoxy, which further comprises a cycloaliphatic epoxy component, and an epoxy component having an aromatic glycidyl ether group, wherein the majority of the epoxy is the cycloaliphatic epoxy component are described and claimed. Also described and claimed is a process for using the liquid radiation curable resins for additive manufacturing to create molds for dental aligners, and the three-dimensional molds made from the liquid radiation curable resins for additive manufacturing.
    本发明描述并要求用于增材制造的液体辐射固化树脂组合物,该组合物包含:约5至约30重量%的氧杂环丁烷;(甲基)丙烯酸酯组分;阳离子光引发剂;自由基光引发剂;以及约50至约80重量%的环氧树脂,该环氧树脂进一步包含环脂族环氧树脂组分和具有芳香族缩水甘油醚基团的环氧树脂组分,其中环氧树脂的大部分是环脂族环氧树脂组分。本发明还描述并要求一种工艺,该工艺使用用于快速成型制造的液态辐射固化树脂来制造牙齿矫正器的模具,以及使用用于快速成型制造的液态辐射固化树脂制造的三维模具。
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