4-[3-(Dimethylamino)propyliminomethyl]benzene-1,3-diol

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: 4-[3-(Dimethylamino)propyliminomethyl]benzene-1,3-diol
• 化学式: C₁₂H₁₈N₂O₂
• 分子量: 222.28
• InChiKey: QAPOGFNCGKRGJK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.2
• 重原子数：
  16
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.42
• 拓扑面积：
  56.1
• 氢给体数：
  2
• 氢受体数：
  4

文献信息

• CHAIN EXTENDER, POLYURETHANE AND MODIFICATION METHOD THEREFOR, POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD
  申请人：Kuraray Co., Ltd.

  公开号：EP3623402A1

  公开（公告）日：2020-03-18

  Disclosed are a Schiff base-containing chain extender that is a diol having a Schiff base or a derivative thereof, as well as a polyurethane produced using the same and a modification method thereof, and a polishing layer including a polyurethane and a polishing method using the polishing layer.

  本发明公开了一种含有希夫碱的扩链剂，它是一种具有希夫碱或其衍生物的二元醇，还公开了使用该扩链剂生产的聚氨酯及其改性方法，以及包括聚氨酯的抛光层和使用该抛光层的抛光方法。
• Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method
  申请人：KURARAY CO., LTD.

  公开号：US11053339B2

  公开（公告）日：2021-07-06

  Disclosed herein are polyurethanes useful for polishing layers, where the polyurethane is a polyurethane having a Schiff base. Also disclosed herein are polishing layers containing the polyurethanes, polishing methods that use the polishing layers, and a modification method including a step of converting the Schiff base into at least one functional group selected from an aldehyde group, a carboxylic acid group, a hydroxyl group, and an amino group.

  本文公开了可用于抛光层的聚氨酯，其中聚氨酯是具有希夫碱的聚氨酯。本文还公开了含有该聚氨酯的抛光层、使用该抛光层的抛光方法，以及一种改性方法，该方法包括将希夫碱转化为至少一种选自醛基、羧酸基、羟基和氨基的官能团的步骤。
• POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER INCLUDING POLYURETHANE AND MODIFICATION METHOD OF THE POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD
  申请人：KURRAY CO., LTD.

  公开号：US20200190247A1

  公开（公告）日：2020-06-18

  Disclosed herein are polyurethanes useful for polishing layers, where the polyurethane is a polyurethane having a Schiff base. Also disclosed herein are polishing layers containing the polyurethanes, polishing methods that use the polishing layers, and a modification method including a step of converting the Schiff base into at least one functional group selected from an aldehyde group, a carboxylic acid group, a hydroxyl group, and an amino group.